Abstract

This article focused on the fabrication of 7-hydroxy 4- methyl coumarin (7H4MC) dye doped Polyvinyl alcohol/Oxidized Maize Starch (PVA/OMS) blend films by employing user friendly solvent casting technique. The thermal stability, crystallanity, surface morphology and optical properties of the films were investigated by using Thermogravimetric Analysis (TGA), Differential Scanning Calorimetry (DSC), X-ray Diffraction (XRD), Atomic Force Microscopy (AFM), Fluorescence (FL) and Ultraviolet–Visible (UV–Vis) Spectroscopy respectively. The TGA and DSC results illustrate that the blend films are thermally stable and miscible over the entire composition. The XRD analysis confirmed the semi crystalline nature of all the obtained films with the intense peak at 2θ = 19. 49°. The AFM topographic images had shown a smoother and homogeneous surface at the higher weight percentage of 7H4MC of blend films. The UV–Visible spectra display the absorption peaks at 325 nm for control PVA/OMS and two peaks at 329 nm, 370 nm arises after doping of 7H4MC in PS blend associated with π-π* electronic transition may be due to the charge transfer (CT) groups. The optical band gap is reduced on the addition of 7H4MC dye in the control blend. The fluorescence spectra revealed that the fabricated films exhibited good blue light emission under ultraviolet light and shows maximum fluorescence emission at 442 nm for 0.008 wt. % of 7H4MC. Moreover PSC blend films exhibited superior antimicrobial properties as compare to control blend film. Hence, the obtained outcomes are suggested that the PVA/OMS (PSC) blend films are appropriate materials for optical and biological application.

中文翻译：

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7-羟基 4-甲基香豆素染料对 PVA/OMS 混合薄膜的热、荧光和抗菌性能的主导性质

摘要

本文重点介绍了使用用户友好的溶剂浇铸技术制备 7-羟基 4-甲基香豆素 (7H4MC) 染料掺杂的聚乙烯醇/氧化玉米淀粉 (PVA/OMS) 共混薄膜。通过使用热重分析 (TGA)、差示扫描量热法 (DSC)、X 射线衍射 (XRD)、原子力显微镜 (AFM)、荧光 (FL) 研究了薄膜的热稳定性、结晶度、表面形貌和光学性能和紫外-可见（UV-Vis）光谱。TGA 和 DSC 结果表明共混膜在整个组合物中是热稳定和可混溶的。XRD 分析证实了所有获得的薄膜的半结晶性质，在 2θ = 19. 49° 处有强峰。AFM 形貌图像显示，在较高重量百分比的 7H4MC 共混膜下，表面更光滑和均匀。紫外-可见光谱显示控制 PVA/OMS 在 325 nm 处的吸收峰和在 329 nm 处的两个峰，370 nm 在与 π-π* 电子跃迁相关的 PS 混合物中掺杂 7H4MC 后出现可能是由于电荷转移（ CT) 组。在对照混合物中加入 7H4MC 染料后，光学带隙减小。荧光光谱表明，制备的薄膜在紫外光下表现出良好的蓝光发射，并在 0.008 重量比下在 442 nm 处显示出最大荧光发射。7H4MC 的百分比。此外，与对照共混膜相比，PSC 共混膜表现出优异的抗菌性能。因此，