Pulsed hydrocarbon ions produced in a plasma focus device were used to irradiate different substrate materials (Si, Ti, Mo and W) and to deposit thin films of carbon material over it. High energetic and high intensity pulsed hydrocarbon ions were produced when plasma focus device was filled with 0.5 mbar of acetylene gas and operated at 2 kJ. Effects of substrate materials properties, its thermal evolution under pulsed irradiation of energetic ions and plasma streams on the deposited films have been studied. Visible Raman spectroscopic measurements confirmed that deposited films were of diamond-like-carbon. Fraction of sp³ bonded carbon in films on different substrate materials (16%, 8.7%, 13% and 18.9% on Si, Ti, Mo and W respectively) was found to be correlated to substrate materials thermal properties i.e. high fraction of sp³ bonded carbon was observed over substrate materials having high thermal conductivity. Carbon atom concentrations were measured to be different (22.46 at. %, 22.7 at. %, 10.4 at. % and 32 at. % on Si, Ti, Mo and W respectively) over different substrates. Surface morphologies of DLC were also observed to be different for different substrates. On inserting graphite at anode tip, fraction of sp³ bonded carbon in DLC coating over Si substrate increased to 19.5%.

在等离子体聚焦装置中产生的脉冲烃离子被用来照射不同的基材材料（Si、Ti、Mo 和 W）并在其上沉积碳材料薄膜。当等离子体聚焦装置充满 0.5 mbar 的乙炔气体并在 2 kJ 下运行时，会产生高能量和高强度的脉冲烃离子。已经研究了衬底材料特性的影响，其在高能离子和等离子体流的脉冲辐照下对沉积膜的热演化。可见拉曼光谱测量证实沉积膜是类金刚石碳。sp ^{3 的}分数发现不同基板材料上薄膜中的键合碳（Si、Ti、Mo 和 W 分别为 16%、8.7%、13% 和 18.9%）与基板材料的热性能相关，即观察到高比例的 sp ³键合碳在具有高热导率的衬底材料上。碳原子浓度被测量为不同的（Si、Ti、Mo 和 W 上的碳原子浓度分别为 22.46 原子％、22.7 原子％、10.4 原子％和 32 原子％）在不同的基材上。DLC 的表面形态也被观察到对于不同的基材是不同的。在阳极尖端插入石墨时，Si 衬底上 DLC 涂层中 sp ³键合碳的比例增加到 19.5%。