当前位置: X-MOL 学术Appl. Phys. A › 论文详情
Our official English website, www.x-mol.net, welcomes your feedback! (Note: you will need to create a separate account there.)
Melt electrowriting stacked architectures with high aspect ratio
Applied Physics A ( IF 2.5 ) Pub Date : 2021-05-12 , DOI: 10.1007/s00339-021-04582-x
Gaofeng Zheng , Gang Fu , Jiaxin Jiang , Xiang Wang , Wenwang Li , Ping Wang

Melt electrowriting (MEW) approach with constant working distance has been developed to weaken the charge interferences and to enhance the architecture mechanical strength, by which various stacked architectures with high aspect ratio can be achieved. The deposited fiber guides the subsequent jet to print layer by layer along the pre-designed patterns without fiber pulsing. The position of the nozzle is raised simultaneously during the direct-writing process to maintain a constant working distance, and then, the deposition offset of the fiber layer can be decreased. The effects of the processing parameters on the MEW fibers with diameters distributed in the range of 50–125 µm have been studied. Patterns of polygon and characters with fiber layer number of 200 and aspect ratio higher than 180 are direct-written accurately. The maximum height of the direct-written patterns reaches 9 mm. The proposed approach is a good method to realize the direct additive manufacturing of high-aspect-ratio architectures and to promote its industrial applications.



中文翻译:

高纵横比的融化电子书写堆叠体系结构

已经开发了具有恒定工作距离的熔融电子书写(MEW)方法,以减弱电荷干扰并增强体系结构机械强度,从而可以实现具有高深宽比的各种堆叠体系结构。沉积的纤维引导后续的射流沿着预先设计的图案逐层打印,而不会产生纤维脉冲。喷嘴的位置在直接写入过程中同时升高以保持恒定的工作距离,然后可以减小纤维层的沉积偏移。研究了加工参数对直径在50–125 µm范围内的MEW纤维的影响。纤维层数为200,长宽比大于180的多边形和字符的图案可以直接书写。直写图案的最大高度达到9毫米。所提出的方法是实现高纵横比建筑的直接增材制造并促进其工业应用的好方法。

更新日期:2021-05-12
down
wechat
bug