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Precise interferometric surface profiling of silicon wafer using sampling window and wavelength tuning
Journal of Mechanical Science and Technology ( IF 1.5 ) Pub Date : 2021-04-20 , DOI: 10.1007/s12206-021-0434-2
Jurim Jeon , Sungtae Kim , Yangjin Kim

Phase-shifting fringe analysis using wavelength tuning has been widely applied to interferometric surface measurements of optical flats. However, when measuring the silicon wafer that has the highly reflective surface, the correlated error between the second harmonic component and phase-shift miscalibration can be a significant error in the phase distribution. In this study, a novel design method to derive a phase-extraction algorithm is proposed for the suppression of the correlated error. A new 11-frame algorithm was developed using the Blackman sampling window. The 11-frame algorithm was visualized on the frequency space and complex plane, and its compensation capability was confirmed by numerical error analysis comparing with other algorithms. Finally, the silicon wafer surface was profiled by applying the 11-frame algorithm and Fizeau interferometer.



中文翻译:

使用采样窗口和波长调谐对硅晶片进行精确的干涉表面轮廓分析

使用波长调谐的相移条纹分析已广泛应用于光学平板的干涉表面测量。然而,当测量具有高反射表面的硅晶片时,二次谐波分量与相移失准之间的相关误差可能是相位分布中的重大误差。在这项研究中,提出了一种新的推导相位提取算法的设计方法来抑制相关误差。使用布莱克曼采样窗口开发了一种新的11帧算法。在频域和复平面上可视化了11帧算法,并通过数值误差分析与其他算法进行比较,证实了其补偿能力。最后,

更新日期:2021-04-20
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