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Precise interferometric surface profiling of silicon wafer using sampling window and wavelength tuning

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Abstract

Phase-shifting fringe analysis using wavelength tuning has been widely applied to interferometric surface measurements of optical flats. However, when measuring the silicon wafer that has the highly reflective surface, the correlated error between the second harmonic component and phase-shift miscalibration can be a significant error in the phase distribution. In this study, a novel design method to derive a phase-extraction algorithm is proposed for the suppression of the correlated error. A new 11-frame algorithm was developed using the Blackman sampling window. The 11-frame algorithm was visualized on the frequency space and complex plane, and its compensation capability was confirmed by numerical error analysis comparing with other algorithms. Finally, the silicon wafer surface was profiled by applying the 11-frame algorithm and Fizeau interferometer.

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Acknowledgments

This work was supported by National Research Foundation of Korea (NRF) grant funded by the Korean government (MSIT) (2020R1F1A1075993).

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Authors and Affiliations

  1. School of Mechanical Engineering, Pusan National University, 2, Busandaehak-ro 63beon-gil, Geumjeong-gu, Busan, 46241, Korea

    Jurim Jeon, Sungtae Kim & Yangjin Kim

Authors
  1. Jurim Jeon
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  2. Sungtae Kim
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  3. Yangjin Kim
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Corresponding author

Correspondence to Yangjin Kim.

Additional information

Jurim Jeon is a B.S. course student and an undergraduate researcher at the School of Mechanical Engineering, Pusan National University. Her research interests include precision measurement using wavelength-scanning Fizeau interferometry, and the design of phase-extraction algorithms.

Sungtae Kim is a master and doctor-integrated course student at the School of Mechanical Engineering, Pusan National University. He received his B.S. degree at the School of Mechanical Engineering, Pusan National University in 2019. His research interests include precision measurement using wavelength-scanning Fizeau interferometry and fringe analysis using phase shifting.

Yangjin Kim is an Associated Professor at the School of Mechanical Engineering, Pusan National University. He obtained his B.S. and Ph.D. degrees at the Department of Mechanical Engineering, The University of Tokyo, in 2007 and 2015, respectively. Prof. Kim was a researcher at the Korea Institute of Machinery and Materials (KIMM) from 2009 to 2012 as a military service. His research interests include precision measurement, wavelength-scanning Fizeau interferometry, fringe analysis using phase shifting.

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Jeon, J., Kim, S. & Kim, Y. Precise interferometric surface profiling of silicon wafer using sampling window and wavelength tuning. J Mech Sci Technol 35, 2177–2184 (2021). https://doi.org/10.1007/s12206-021-0434-2

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  • DOI: https://doi.org/10.1007/s12206-021-0434-2

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