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Effect of Thermal Exposure on the Crystallographic Features and Surface Hardness of AA-7075-T6 Material
Brazilian Journal of Physics ( IF 1.5 ) Pub Date : 2021-04-03 , DOI: 10.1007/s13538-021-00895-7
Muhammad Zakria Butt , Muhammad Rashid Khan , Samee Ullah , Sajjad Ahmad , Farooq Bashir , Syed Zafar Ilyas

Structural material AA-7075-T6, an aluminium-based alloy, was subjected to thermal exposure for 60 min in the temperature range 100–300 °C with an interval of 20 °C. Harris analysis of the XRD patterns of specimens showed that the un-exposed AA-7075-T6 material was texture free, but upon thermal exposure, it developed texture. The crystallite size and lattice strain of the specimens were evaluated by Williamson-Hall analysis of the XRD patterns. Thermal exposure in the temperature range 100‒200 °C had no noticeable effect on the surface hardness. However, it decreased rapidly with the increase in temperature from 200 to 300 °C. This behaviour was accounted for in terms of dislocation glide by Orowan mechanism in an atmosphere of semi-coherent ή precipitates (MgZn2) in the main matrix. Breakdown of Hall–Petch relation established that crystallite boundaries do not make any significant contribution to the surface hardness, but the resistance to glide dislocations is offered by the semi-coherent ή precipitates (MgZn2) present in the matrix.



中文翻译:

热暴露对AA-7075-T6材料的晶体学特征和表面硬度的影响

结构材料AA-7075-T6(一种铝基合金)在100-300°C的温度范围内以20°C的间隔进行热暴露60分钟。样品的XRD图谱的哈里斯(Harris)分析表明,未曝光的AA-7075-T6材料没有纹理,但是在热暴露后会出现纹理。通过X射线衍射图的Williamson-Hall分析评估了样品的微晶尺寸和晶格应变。在100-200°C的温度范围内进行热暴露对表面硬度没有明显影响。但是,随着温度从200℃升高到300℃,它迅速下降。此行为是在位错滑移的条件在半相干的气氛中占由奥罗万机构ή析出物(的MgZn 2)在主矩阵中。霍尔佩奇关系的击穿证实微晶边界不使表面硬度提高到任何显著贡献,但对位错滑移的电阻由半相干提供ή析出物(的MgZn 2)存在于基质中。

更新日期:2021-04-04
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