Abstract

We have studied the effects of oxygen on hydrogenated amorphous/crystalline silicon films in terms of their structural and optical properties. Different “hydrogenated silicon oxide” (SiO:H) and “silicon” (Si:H) films are fabricated between microcrystalline and amorphous transition region. X-ray diffraction, Raman, FTIR and UV–VIS emission spectrometry have been used to characterize different films. A comparison of the results with those of different types of films like “hydrogenated amorphous silicon oxide” (a-SiO:H), “hydrogenated amorphous silicon” (a-Si:H) and “microcrystalline silicon” (μc-Si:H) films reveal their superiority as an excellent substance for solar cell. X-ray diffraction, FTIR, and Raman spectral analysis show that difference of the H dilution effect has a major effect on the structure of the film and the optical properties. Photoluminescence analysis of amorphous silicon–oxygen and silicon-hydride alloy films has established their efficient application appropriate as Si-based light-emitting devices. A large optical band gap of 1.83 eV and appearance of strong photoluminescence at 2.0 eV validates the applicability of a-SiO:H film as a better alternative for the solar cells.

Graphic abstract

中文翻译：

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氧对氢化非晶/结晶硅薄膜的光信号影响研究

摘要

我们已经研究了氧对氢化非晶/结晶硅膜的结构和光学性能的影响。在微晶和非晶过渡区域之间制作了不同的“氢化氧化硅”（SiO：H）和“硅”（Si：H）膜。X射线衍射，拉曼光谱，FTIR和UV-VIS发射光谱已用于表征不同的薄膜。将结果与“氢化非晶硅”（a-SiO：H），“氢化非晶硅”（a-Si：H）和“微晶硅”（μc-Si：H）不同类型薄膜的结果进行比较）薄膜显示了其作为太阳能电池优良物质的优越性。X射线衍射，FTIR和拉曼光谱分析表明，H稀释效应的差异对薄膜的结构和光学性能有重大影响。非晶硅-氧和氢化硅合金膜的光致发光分析已确立了它们作为基于硅的发光器件的有效应用。1.83 eV的大光学带隙和2.0 eV的强光致发光性能证明a-SiO：H薄膜可作为太阳能电池的更好替代品。

图形摘要