A comprehensive study of the reversed arc plasma enhanced CVD (RACVD) reactor utilizing an Ar + H₂ + CH₄ plasma-creating mixture in the pressure range 1–100 Torr with a plasma flow direction opposite to the direction of the arc current was carried out. The reversed arc discharge has rising current–voltage characteristics showing voltage increasing with pressure and hydrogen concentration. The spectrum of the Ar-H₂-CH₄ plasma column includes CH, C₂, and H₂ molecular bands, in addition to H_α, H_β, H_γ, and H_δ lines. The dissociation degree of H₂ was estimated from the intensity ratio I_Hα/I_ArI of the H_α and ArI 750 nm lines using the optical actinometry method, yielding an average dissociation degree of hydrogen in the arc plasma of 15–20%. The average vibrational and rotational temperatures of CH radicals are T_v = T_r = 3000 K ± 300 K. The dissociation degree of hydrogen in the reversed arc discharge was calculated by the advection–diffusion-reaction model and showed reasonably good agreement both with experimental findings and with LTE calculations. The high concentration of nascent hydrogen and hydrocarbon radicals in the reversed arc plasma and its uniform distribution across the arc column makes it suitable for diamond coatings. The results obtained on the interaction of reversed arc plasma with substrates suspended within the current-carrier arc plasma column were applied to the description of a dusty reversed arc plasma in fluidized bed reactors. It was found that the energy effectiveness of the treatment of nanoparticles in the RACVD fluidized bed reactor exceeds 90%.

进行了反向电弧等离子体增强CVD（RACVD）反应器的综合研究，该反应器使用压力范围为1–100 Torr且等离子体流动方向与电弧电流方向相反的Ar + H ₂  + CH ₄等离子生成混合物出来。反向电弧放电具有上升的电流-电压特性，显示电压随压力和氢浓度的增加而增加。除了_Hα，_Hβ，_Hγ和_Hδ线以外，Ar-H ₂ -CH ₄等离子体柱的光谱还包括CH，C ₂和H ₂分子带。H ₂的解离度从强度比I估计_Hα / I_的Ar1为H的_α和使用该光学射测定方法，得到15-20％的电弧等离子体中的氢气的平均解离度的Ar1 750纳米线。CH自由基的平均振动和旋转温度为T _v  =  T _r = 3000 K±300K。通过对流扩散反应模型计算出反向电弧放电中氢的解离度，并且与实验结果和LTE计算均显示出相当好的一致性。反向电弧等离子体中高浓度的新生氢和烃自由基及其在整个电弧塔中的均匀分布使其适用于金刚石涂层。将反向电弧等离子体与悬浮在电流载体电弧等离子体柱内的基板相互作用所获得的结果应用于流化床反应器中粉尘反向电弧等离子体的描述。发现在RACVD流化床反应器中处理纳米颗粒的能量效率超过90％。