Abstract

The growth of epitaxial (111) NiO films on (0001) LiNbO₃ substrates by reactive magnetron sputtering has been reported for the first time. X-ray diffraction analysis of the obtained films was carried out in combination with layer-by-layer plasma etching. It was shown that a low lattice mismatch allows one to obtain structurally perfect thin layers of NiO on LiNbO₃ substrates. With increasing film thickness, the structural perfection of the film deteriorates due to the accumulation of dislocations due to ion bombardment during growth.

中文翻译：

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LiNbO 3衬底上外延NiO薄膜的生长

摘要

首次报道了通过反应磁控溅射在（0001）LiNbO ₃衬底上生长外延（111）NiO膜。结合逐层等离子体蚀刻对获得的膜进行X射线衍射分析。结果表明，低晶格失配使得人们可以在LiNbO ₃衬底上获得结构完美的NiO薄层。随着膜厚度的增加，由于在生长期间由于离子轰击而导致的位错的积累，使膜的结构完善性劣化。