A gas-discharge device based on a planar magnetron and a plasma ion source is considered. The longitudinal injection of an ion beam into the magnetron and sputtering of the cathode and central anode of the magnetron by the ion beam contributes to the ignition of an anomalous low-pressure (below 8 × 10^–2 Pa) glow discharge in the magnetron. It has been found that the discharge ignition voltage decreases with an increase in the ion energy and depends on the ion-beam current in a threshold manner. The prospects of expanding the functionality of planar magnetrons in the synthesis of nanostructured TiN–Cu composite coatings are shown.

中文翻译：

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基于带离子源的平面磁控管的气体溅射装置

考虑基于平面磁控管和等离子体离子源的气体放电装置。将离子束纵向注入到磁控管中，以及离子束对磁控管的阴极和中心阳​​极进行溅射，会引起磁控管中异常的低压辉光放电（低于8×10 ^–2 Pa）。已经发现，放电点火电压随着离子能量的增加而降低，并且以阈值方式取决于离子束电流。显示了在合成纳米结构的TiN-Cu复合涂层中扩展平面磁控管功能的前景。