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A Gas-Discharge Sputtering Device Based on a Planar Magnetron with an Ion Source

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Abstract

A gas-discharge device based on a planar magnetron and a plasma ion source is considered. The longitudinal injection of an ion beam into the magnetron and sputtering of the cathode and central anode of the magnetron by the ion beam contributes to the ignition of an anomalous low-pressure (below 8 × 10–2 Pa) glow discharge in the magnetron. It has been found that the discharge ignition voltage decreases with an increase in the ion energy and depends on the ion-beam current in a threshold manner. The prospects of expanding the functionality of planar magnetrons in the synthesis of nanostructured TiN–Cu composite coatings are shown.

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REFERENCES

  1. Danilin, B.S. and Syrchin, V.K., Magnetronnye raspylitel’nye sistemy (Magnetron Sputtering Systems), Moscow: Radio i Svyaz’, 1982.

  2. Belyanin, A.F., Pashchenko, P.V., and Semenov, A.P., Prib. Tekh. Eksp., 1991, no. 3, p. 220.

  3. Raizer, Yu.P., Fizika gazovogo razryada (Physics of Gas Discharge), Moscow: Nauka, 1987.

  4. Semenov, A.P. and Batuev, B.-Sh.Ch., Prib. Tekh. Eksp., 1991, no. 5, p. 192.

  5. Mesyats, G.A., Impul’snaya energetika i elektronika (Pulse Power Engineering and Electronics), Moscow: Nauka, 2004.

  6. Lee, K.J. and Musset, A., US Patent 4716340, 1987.

  7. Semenov, A.P., Tekhnika raspyleniya ionnymi puchkami (Technique for Sputtering by Ion Beams), Ulan-Ude: Buryatia Scientific Center of the Siberian Branch of Russ. Acad. Sci., 1996.

  8. Semenov, A.P., Puchki raspylyayushchikh ionov: poluchenie i primenenie (Sputtering Ions Beams: Generation and Application), Ulan-Ude: Buryatia Scientific Center of the Siberian Branch of Russ. Acad. Sci., 1999.

  9. Semenov, A.P., Sib. Fiz.-Tekh. Zh., 1993, no. 6, p. 68.

  10. Semenov, A.P. and Semenova, I.A., Instrum. Exp. Tech., 2009, vol. 52, no. 1, pp. 99–103. https://doi.org/10.1134/S0020441209010151

    Article  Google Scholar 

  11. Semenov, A.P., Tech. Phys., 2007, vol. 52, no. 2, p. 276. https://doi.org/10.1134/S1063784207020211

    Article  Google Scholar 

  12. Istochniki zaryazhennykh chastits s plazmennym emitterom (Charged Particle Sources with Plasma Emitters), Shchanin, P.M., Ed., Yekaterinburg: UIF Nauka, 1993.

    Google Scholar 

  13. Semenov, A.P., Prib. Tekh. Eksp., 1993, no. 5, p. 128.

  14. Feldman, L.C. and Mayer, J.W., Fundamentals of Surface and Thin Film Analysis, Amsterdam: North Holland, Elsevier Science Publ., 1986.

    Google Scholar 

  15. Levitskii, S.M., Sbornik zadach i raschetov po fizicheskoi elektronike (Collection of Problems and Calculations on Physical Electronics), Kiev: Kiev State Univ., 1964.

  16. Brusilovskii, B.A., Kineticheskaya ionno-elektronnaya emissiya (Kinetic Ion-Electron Emission), Moscow: Energoatomizdat, 1990.

  17. Mesyats, G.A. and Proskurovskii, D.I., Impul’snyi elektricheskii razryad v vakuume (Pulse Electrical Discharge in Vacuum), Novosibirsk: Nauka, 1984.

  18. Sputtering by Particle Bombardment I. Physical Sputtering of Single-Element Solids, Behrisch, R., Ed., Berlin, Heidelberg: Springer, 1981.

    Google Scholar 

  19. Semenov, A.P., Tsyrenov, D.B.-D., and Semenova, I.A., RF Patent 2649355, Byull. Izobret., 2018, no. 10.

  20. Semenov, A.P., Tsyrenov, D.B.-D., and Semenova, I.A., Instrum. Exp. Tech., 2017, vol. 60, no. 6, p. 892. https://doi.org/10.1134/S0020441217060094

    Article  Google Scholar 

  21. Ivanov, Yu.F., Koval, N.N., Krysina, O.V., Baumbach, T., Doyle, S., Slobodsky, T., Timchenko, N.A., Galimov, R.M., and Shmakov, A.N., Surf. Coat. Technol., 2012, vol. 207, p. 430. https://doi.org/10.1016/j.surfcoat.2012.07.037

    Article  Google Scholar 

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Funding

This study was supported by the Russian Foundation for Basic Research (project no. 20-08-00207_а) and the State Job of the Ministry of Science and Education of the Russian Federation (topic no. 0336-2019-0009).

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Authors and Affiliations

  1. Institute of Physical Materials Science, Siberian Branch, Russian Academy of Sciences, 670047, Ulan-Ude, Russia

    A. P. Semenov, I. A. Semenova, D. B.-D. Tsyrenov & E. O. Nikolaev

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  1. A. P. Semenov
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  2. I. A. Semenova
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  3. D. B.-D. Tsyrenov
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  4. E. O. Nikolaev
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Corresponding author

Correspondence to A. P. Semenov.

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Translated by A. Seferov

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Semenov, A.P., Semenova, I.A., Tsyrenov, D.BD. et al. A Gas-Discharge Sputtering Device Based on a Planar Magnetron with an Ion Source. Instrum Exp Tech 63, 782–786 (2020). https://doi.org/10.1134/S0020441220050218

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  • DOI: https://doi.org/10.1134/S0020441220050218

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