Abstract

We have prepared the anode cell of an X-ray lithograph in the form of a PolySi/Si₃N₄/SiO₂ membrane structure using group technology. The design of the stand for determining mechanical properties of membranes has been modernized. The critical pressure of a membrane structure with a diameter 250 μm varies in the range from 0.484 to 0.56 MPa for 15 samples. The mechanical strength of the PolySi*/Si₃N₄/SiO₂ structure is 3.13 GPa. The new model in the Comsol package shows good correlation between the experimental critical pressure and the theoretical mechanical strength of the membrane. The distribution of mechanical stresses over the membrane has been obtained by simulation and analytic calculation. It is proved that the structure breaking region is localized at the membrane/substrate interface.

中文翻译：

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X射线光刻机阳极电池力学性能的实验测定

摘要

我们已经使用组技术制备了以PolySi / Si ₃ N ₄ / SiO ₂膜结构形式的X射线光刻机的阳极电池。确定膜的机械性能的支架设计已经现代化。对于15个样品，直径为250μm的膜结构的临界压力在0.484至0.56MPa的范围内变化。PolySi * / Si ₃ N ₄ / SiO ₂的机械强度结构为3.13 GPa。Comsol软件包中的新模型显示出实验临界压力与膜的理论机械强度之间的良好相关性。通过模拟和解析计算获得了机械应力在膜上的分布。证明结构破坏区域位于膜/底物界面。