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Growth and Characterization of ZnO and Al-Doped ZnO Thin Films by a Homemade Spray Pyrolysis
Semiconductors ( IF 0.6 ) Pub Date : 2020-11-02 , DOI: 10.1134/s1063782620110184
Y. Larbah , M. Adnane , B. Rahal

Abstract

In this work, we have prepared the undoped and Al-doped ZnO thin films by a homemade spray pyrolysis method at 450°C onto glass substrates. The X-ray diffraction patterns of undoped ZnO and aluminized zinc-oxide (AZO) thin films exhibit hexagonal wurtzite crystal structure with high crystalline quality, the crystallite size is nanometric. The morphology of the undoped and Al-doped ZnO thin films also indicate that all samples have a nanoscale grain size around 50 nm, and the microstructure of ZnO films is highly influenced by the aluminum doping. The two films are characterized by UV-visible spectrophotometry showing that the films have a whole optical transmission above 85% in the visible range. The composition of our films is obtained by energy dispersive spectrum, confirmed by Auger electron spectroscopy (AES) and by Rutherford back-scattering spectrometry (RBS) techniques.



中文翻译:

自制喷雾热解法生长ZnO和掺铝ZnO薄膜及其表征

摘要

在这项工作中,我们通过在450°C上采用自制的喷雾热解方法在玻璃基板上制备了未掺杂和Al掺杂的ZnO薄膜。未掺杂的ZnO和镀铝的氧化锌(AZO)薄膜的X射线衍射图显示六方纤锌矿晶体结构,具有较高的晶体质量,微晶尺寸为纳米级。未掺杂和铝掺杂的ZnO薄膜的形貌还表明,所有样品的纳米级晶粒尺寸均在50 nm左右,铝掺杂对ZnO薄膜的微观结构影响很大。通过紫外-可见分光光度法表征了这两个膜,表明该膜在可见范围内具有大于85%的整体光学透射率。我们的薄膜的成分是通过能量色散光谱获得的,

更新日期:2020-11-03
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