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Problems Arising from Using KOH–IPA Etchant to Texture Silicon Wafers
Technical Physics ( IF 0.7 ) Pub Date : 2020-10-19 , DOI: 10.1134/s1063784220100047
N. A. Chuchvaga , N. M. Kislyakova , N. S. Tokmoldin , B. A. Rakymetov , A. S. Serikkanov

Abstract

Wet chemical processing of single-crystal silicon wafers, including their texturing, is a key process step in the fabrication of high-efficiency solar cells. Methods of texturing single-crystal silicon wafers used in solar cell technology have been studied. Optimal texturing parameters have been determined for test samples, and the most effective etchant for texturing, a KOH–isopropanol solution, has been found.



中文翻译:

使用KOH–IPA蚀刻剂对硅晶片进行织构化带来的问题

摘要

单晶硅晶片的湿化学处理(包括其纹理化)是高效太阳能电池制造中的关键工艺步骤。已经研究了用于太阳能电池技术的单晶硅晶片的纹理化方法。已经确定了测试样品的最佳纹理化参数,并且发现了用于纹理化的最有效蚀刻剂,即KOH-异丙醇溶液。

更新日期:2020-10-30
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