Skip to main content
Log in

Problems Arising from Using KOH–IPA Etchant to Texture Silicon Wafers

  • SOLID STATE ELECTRONICS
  • Published:
Technical Physics Aims and scope Submit manuscript

Abstract

Wet chemical processing of single-crystal silicon wafers, including their texturing, is a key process step in the fabrication of high-efficiency solar cells. Methods of texturing single-crystal silicon wafers used in solar cell technology have been studied. Optimal texturing parameters have been determined for test samples, and the most effective etchant for texturing, a KOH–isopropanol solution, has been found.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Fig. 1.
Fig. 2.
Fig. 3.
Fig. 4.
Fig. 5.

Similar content being viewed by others

REFERENCES

  1. L. Seidel, A. Csepregi, H. Heuberger, and H. Baumgärtel, J. Electrochem. Soc. 137 (11), 3612 (1990). https://doi.org/10.1149/1.2086277

    Article  ADS  Google Scholar 

  2. P. Campbell and M. A. Green, J. Appl. Phys. 62, 243 (1987). https://doi.org/10.1063/1.339189

    Article  ADS  Google Scholar 

  3. S. Olibet, E. Vallat-Sauvain, L. Fesquet, Ch. Monachon, A. Hessler-Wyser, J. Damon-Lacoste, S. De Wolf, and Ch. Ballif, Phys. Status Solidi A 207 (3), 651 (2010). https://doi.org/10.1002/pssa.200982845

    Article  ADS  Google Scholar 

  4. A. Froitzheim, K. Brendel, L. Elstner, W. Fuhs, K. Kliefoth, and M. Schmidt, J. Non-Cryst. Solids 299302, 663 (2002). https://doi.org/10.1016/S0022-3093(01)01029-8

  5. “Overview and Evolution of Silicon Wafer Cleaning Technology,” in Handbook of Silicon Wafer Cleaning Technology, Ed. by K. Reinhardt and W. Kern, 2nd ed. (William Andrew, 2008), pp. 3–92.

    Google Scholar 

  6. Handbook of Silicon Wafer Cleaning Technology, Ed. by K. Reinhardt and W. Kern, 2nd ed. (William Andrew, 2008). http://www.sciencedirect.com/science/book/-9780815515548

    Google Scholar 

  7. H. Dekkers, F. Duerinckx, J. Szlufcik, and J. Nijs, Opto-Electron. Rev. 8 (4), 311 (2000).

    Google Scholar 

  8. I. Melnyk, E. Wefringhaus, M. McCann, A. Helfricht, A. Hauser, and P. Fath, “Fath Na2CO3 as an alternative to NAOH/IPA for texturisation of monocrystalline silicon,” in Proc. 19thEur. Photovoltaic Solar Energy Conf. and Exhibition (Paris, France, June 7–11, 2004), p. 1090.

  9. P. Papet, O. Nichiporuk, A. Kaminski, Y. Rozier, J. Kraiem, J.-F. Lelievre, A. Chaumartin, A. Fave, and M. Lemiti, Sol. Energy Mater. Sol. Cells 90 (15), 2319 (2006). https://doi.org/10.1016/j.solmat.2006.03.005

    Article  Google Scholar 

  10. K. Birmann, M. Zimmer, and J. Rentsch, “Fast alkaline etching on monocrystalline wafers in KOH/CHX,” in Proc. 23rd Eur. Photovoltaic Solar Energy Conf. and Exhibition (Valencia, Spain, September 1–5,2008), pp. 1608–1611. https://doi.org/10.4229/23rdEUPVSEC2008-2CV.5.8

  11. K. Wijekoon, T. Weidman, S. Paak, and K. MacWilliams, “Production ready novel texture etching process for fabrication of single crystalline silicon solar cells,” in Proc. 35th IEEE Photovoltaic Specialists Conf. (Honolulu, HI, USA, June 20–25,2010), p. 3635. https://doi.org/10.1109/PVSC.2010.5614441

  12. N. A. Chuchvaga, N. M. Kislyakova, K. P. Aimaganbetov, B. A. Rakymetov, and N. S. Tokmoldin, Rec. Contr. Phys. 67 (4), 108 (2018).

    Google Scholar 

  13. S. E. Nikitin, A. V. Bobyl, N. R. Avezova, and E. I. Terukov, Semiconductors 52 (13), 1782 (2018). https://doi.org/10.1134/S1063782618130134

    Article  ADS  Google Scholar 

Download references

ACKNOWLEDGMENTS

The authors thank the administrations of the Institute of Physics and Technology and Research and Production Center of Agricultural Engineering for enabling this research to be conducted.

Funding

This research was supported by the Ministry of Education and Science of Republic of Kazakhstan (projects nos. BR05236498, AP05133645, AP05133651, AP05130235) and AO Science Foundation (project no. 0355-18-GK).

Author information

Authors and Affiliations

Authors

Corresponding author

Correspondence to N. A. Chuchvaga.

Ethics declarations

The authors declare that they have no conflicts of interest.

Additional information

Translated by V. Isaakyan

Rights and permissions

Reprints and permissions

About this article

Check for updates. Verify currency and authenticity via CrossMark

Cite this article

Chuchvaga, N.A., Kislyakova, N.M., Tokmoldin, N.S. et al. Problems Arising from Using KOH–IPA Etchant to Texture Silicon Wafers. Tech. Phys. 65, 1685–1689 (2020). https://doi.org/10.1134/S1063784220100047

Download citation

  • Received:

  • Revised:

  • Accepted:

  • Published:

  • Issue Date:

  • DOI: https://doi.org/10.1134/S1063784220100047

Navigation