Abstract

Molybdenum oxide is one of the most important inorganic material, which exhibits several phases, such as MoO₃, MoO₂, Mo₄O₁₁, Mo₅O₁₄, etc. Among them, molybdenum trioxide (MoO₃) can crystallize in various phases, such as orthorhombic, monoclinic etc., which makes it useful for possible applications in chemical, electrical and electrochemical industries. In this work, MoO₃ films were obtained by pulsed laser deposition by varying the substrate temperature from room temperature to 400°C. The thin films were deposited on fine cleaned glass substrates coated with fluorine tin oxide under a pressure of 10^–5 mbar. X-ray diffraction patterns display two polymorphic phases of MoO₃ (α and β), but no other phases are observed, and the structure changes from orthorhombic to monoclinic. The substrate temperature strongly influences the structure and surface topography. Morphological studies show the surface homogeneity, crack-free, layered structure and crystallinity of the films. The band gap of the obtained MoO₃ thin films increases from 3.0 to 3.39 eV with increasing substrate temperature from room temperature to 400°C.

中文翻译：

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基板温度对三氧化钼薄膜生长的影响

摘要

氧化钼是最重要的无机材料之一，它表现出多个相，如MoO ₃，MoO ₂，Mo ₄ O ₁₁，Mo ₅ O ₁₄等。其中，三氧化钼（MoO ₃）可以在不同的相中结晶。 ，例如斜方晶系，单斜晶系等，使其在化学，电气和电化学行业的可能应用中很有用。在这项工作中，通过将基板温度从室温更改为400°C，通过脉冲激光沉积获得了MoO ₃膜。薄膜在10 ^–5的压力下沉积在涂有氟氧化锡的精细清洁玻璃基板上毫巴 X射线衍射图显示出MoO _3的两个多晶相（α和β），但未观察到其他相，并且结构从斜方晶向单斜晶变化。基板温度强烈影响结构和表面形貌。形态学研究表明膜的表面均匀性，无裂纹，分层结构和结晶度。随着基板温度从室温升高到400℃ ，获得的MoO ₃薄膜的带隙从3.0增加到3.39eV。