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Effect of Substrate Temperature on the Growth of Molybdenum Trioxide Thin Films

  • SURFACE AND THIN FILMS
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Abstract

Molybdenum oxide is one of the most important inorganic material, which exhibits several phases, such as MoO3, MoO2, Mo4O11, Mo5O14, etc. Among them, molybdenum trioxide (MoO3) can crystallize in various phases, such as orthorhombic, monoclinic etc., which makes it useful for possible applications in chemical, electrical and electrochemical industries. In this work, MoO3 films were obtained by pulsed laser deposition by varying the substrate temperature from room temperature to 400°C. The thin films were deposited on fine cleaned glass substrates coated with fluorine tin oxide under a pressure of 10–5 mbar. X-ray diffraction patterns display two polymorphic phases of MoO3 (α and β), but no other phases are observed, and the structure changes from orthorhombic to monoclinic. The substrate temperature strongly influences the structure and surface topography. Morphological studies show the surface homogeneity, crack-free, layered structure and crystallinity of the films. The band gap of the obtained MoO3 thin films increases from 3.0 to 3.39 eV with increasing substrate temperature from room temperature to 400°C.

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Authors and Affiliations

  1. Thin Film Research Laboratory, Division of Physics, Department of Science and Humanities, Vignan’s Foundation for Science, Technology and Research (Deemed to be University), 522213, Vadlamudi, Guntur, Andhra Pradesh, India

    Divya Dixit & K. V. Madhuri

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  1. Divya Dixit
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  2. K. V. Madhuri
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Correspondence to K. V. Madhuri.

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Divya Dixit, Madhuri, K.V. Effect of Substrate Temperature on the Growth of Molybdenum Trioxide Thin Films. Crystallogr. Rep. 65, 792–797 (2020). https://doi.org/10.1134/S1063774520050065

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  • DOI: https://doi.org/10.1134/S1063774520050065

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