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Modeling Thermal Gas Dynamic Processes of the Production of Silicon from Its Halides
Theoretical Foundations of Chemical Engineering ( IF 0.8 ) Pub Date : 2020-09-29 , DOI: 10.1134/s0040579520040260
L. V. Shabarova , A. D. Plekhovich , A. M. Kut’in , P. G. Sennikov , R. A. Kornev

Abstract

A procedure was developed to model the gas-dynamic and thermal conditions of the production of powdered silicon from silicon tetrachloride and tetrafluoride in a high-frequency induction plasma chemical reactor. The model includes a description of the turbulent flow of a mixture of ideal viscous compressible gases while taking into account the induction heating of the gas by conduction, convection, and radiation, as well as taking into account the effect of the electromagnetic force on plasma motion. The powdered particles form according to the results of the thermodynamic calculations, and the particle distribution in the flow is described by the diffusion mechanism. The results of modeling the conversion of volatile silicon chloride and fluoride in a swirl-stabilized high-frequency induction plasmatron are presented.



中文翻译:

从卤化物生产硅的热气动力学过程建模

摘要

开发了一种程序来模拟在高频感应等离子体化学反应器中由四氯化硅和四氟化硅生产粉状硅的气体动力学和热条件。该模型包括对理想粘性可压缩气体混合物的湍流的描述,同时考虑了通过传导,对流和辐射引起的气体感应加热,以及考虑了电磁力对等离子运动的影响。根据热力学计算的结果形成粉末状颗粒,并通过扩散机理描述流中的颗粒分布。给出了在稳定涡流的高频感应等离子加速器中模拟挥发性氯化硅和氟化物转化的结果。

更新日期:2020-10-02
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