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Modeling Thermal Gas Dynamic Processes of the Production of Silicon from Its Halides

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Abstract

A procedure was developed to model the gas-dynamic and thermal conditions of the production of powdered silicon from silicon tetrachloride and tetrafluoride in a high-frequency induction plasma chemical reactor. The model includes a description of the turbulent flow of a mixture of ideal viscous compressible gases while taking into account the induction heating of the gas by conduction, convection, and radiation, as well as taking into account the effect of the electromagnetic force on plasma motion. The powdered particles form according to the results of the thermodynamic calculations, and the particle distribution in the flow is described by the diffusion mechanism. The results of modeling the conversion of volatile silicon chloride and fluoride in a swirl-stabilized high-frequency induction plasmatron are presented.

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Authors and Affiliations

  1. Devyatykh Institute of Chemistry of High-Purity Substances, Russian Academy of Sciences, 603950, Nizhny Novgorod, Russia

    L. V. Shabarova, A. D. Plekhovich, A. M. Kut’in, P. G. Sennikov & R. A. Kornev

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  1. L. V. Shabarova
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  2. A. D. Plekhovich
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  3. A. M. Kut’in
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  4. P. G. Sennikov
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  5. R. A. Kornev
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Correspondence to L. V. Shabarova.

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Translated by V. Glyanchenko

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Shabarova, L.V., Plekhovich, A.D., Kut’in, A.M. et al. Modeling Thermal Gas Dynamic Processes of the Production of Silicon from Its Halides. Theor Found Chem Eng 54, 631–640 (2020). https://doi.org/10.1134/S0040579520040260

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