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Deposition of Films from a Mixture of Hexamethylcyclotrisilazane Vapor and Argon in Inductively Coupled Plasma
Glass Physics and Chemistry ( IF 0.8 ) Pub Date : 2020-08-05 , DOI: 10.1134/s108765961906018x
V. R. Shayapov , M. N. Chagin , A. N. Kolodin , M. L. Kosinova

Abstract

In an inductively coupled high-frequency discharge plasma, SiCxNy:H films are obtained from a mixture of hexamethylcyclotrisilazane vapor and argon at substrate temperatures of 100 to 400°C and a discharge power of 200 W. The simplest plasma components (nitrogen, cyan, silicon atoms, CH free radicals, and C2 dimers) are determined. Some physicochemical properties of the films, including the growth rate, types of chemical bonds, refractive index, transparency interval, and contact angle, are studied. The synthesized films have a polymer-like structure.


中文翻译:

电感耦合等离子体中六甲基环三硅氮烷蒸气和氩气混合物的沉积膜

摘要

在感应耦合的高频放电等离子体中,SiC x N y:H膜是由六甲基环三硅氮烷蒸气和氩气的混合物在100至400°C的基板温度和200 W的放电功率下获得的。最简单的等离子体成分(氮确定了青色,硅原子,CH自由基和C 2二聚体。研究了薄膜的一些物理化学性质,包括生长速率,化学键的类型,折射率,透明度间隔和接触角。合成的膜具有类似聚合物的结构。
更新日期:2020-08-05
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