Abstract

In an inductively coupled high-frequency discharge plasma, SiC_xN_y:H films are obtained from a mixture of hexamethylcyclotrisilazane vapor and argon at substrate temperatures of 100 to 400°C and a discharge power of 200 W. The simplest plasma components (nitrogen, cyan, silicon atoms, CH free radicals, and C₂ dimers) are determined. Some physicochemical properties of the films, including the growth rate, types of chemical bonds, refractive index, transparency interval, and contact angle, are studied. The synthesized films have a polymer-like structure.

中文翻译：

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电感耦合等离子体中六甲基环三硅氮烷蒸气和氩气混合物的沉积膜

摘要

在感应耦合的高频放电等离子体中，SiC _x N _y：H膜是由六甲基环三硅氮烷蒸气和氩气的混合物在100至400°C的基板温度和200 W的放电功率下获得的。最简单的等离子体成分（氮确定了青色，硅原子，CH自由基和C ₂二聚体。研究了薄膜的一些物理化学性质，包括生长速率，化学键的类型，折射率，透明度间隔和接触角。合成的膜具有类似聚合物的结构。