The high-temperature oxidation of ZrAl2 upon exposure to pure O2 at 800–950 °C was studied in terms of the oxidation kinetics and the formation mechanism of the oxide layer. The alloy followed parabolic oxidation kinetics, and the activation energy of oxidation was 239 ± 14 kJ/mol. During the early stages of oxidation below 850 °C, a single-layer oxide formed due to the crystallization of the initially formed amorphous oxide layer. A multilayer oxide structure developed at higher temperatures, due to the slightly higher affinity of oxygen for Zr than for Al and the oxidation-induced compositional changes.

中文翻译：

---

hcp-ZrAl2 高温氧化的显微研究

从氧化动力学和氧化层的形成机制方面研究了 ZrAl2 在 800-950 °C 下暴露于纯 O2 时的高温氧化。该合金遵循抛物线氧化动力学，氧化活化能为239±14 kJ/mol。在低于 850 °C 的早期氧化阶段，由于最初形成的非晶氧化物层的结晶，形成了单层氧化物。由于氧对 Zr 的亲和力略高于对 Al 的亲和力以及氧化引起的成分变化，因此在较高温度下形成了多层氧化物结构。