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Microscopic Investigation of High-Temperature Oxidation of hcp-ZrAl2

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Abstract

The high-temperature oxidation of ZrAl2 upon exposure to pure O2 at 800–950 °C was studied in terms of the oxidation kinetics and the formation mechanism of the oxide layer. The alloy followed parabolic oxidation kinetics, and the activation energy of oxidation was 239 ± 14 kJ/mol. During the early stages of oxidation below 850 °C, a single-layer oxide formed due to the crystallization of the initially formed amorphous oxide layer. A multilayer oxide structure developed at higher temperatures, due to the slightly higher affinity of oxygen for Zr than for Al and the oxidation-induced compositional changes.

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Acknowledgements

The authors are grateful to Dr. Hong Bo (Yanshan University, China) for help with CALPHAD calculations. This work was supported by the National Natural Science Foundation of China (No. 51571148) and the National Key Research and Development Program of China (Nos. 2017YFE0302600 and 2017YFB0701801).

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  1. School of Materials Science and Engineering, Tianjin University, Tianjin, 300350, China

    Zhangping Hu, Yifei Xu, Zongqing Ma, Chong Li, Yuan Huang, Yongchang Liu & Zumin Wang

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Hu, Z., Xu, Y., Ma, Z. et al. Microscopic Investigation of High-Temperature Oxidation of hcp-ZrAl2. Oxid Met 94, 431–445 (2020). https://doi.org/10.1007/s11085-020-10000-z

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