In nuclear reaction experiments, the thin targets are required. In the present work, 30 thin 116Sn targets were prepared using physical vapor deposition technique (preferable for thin film fabrication) on carbon backing with usage efficiency of 98%. The carbon-backed thin target films along with the parting agents are deposited on the particular substrates using a diffusion pump based coating unit. The thicknesses of the targets were verified using α-energy loss and RBS technique and they were in good agreement with each other. The purity of the target, verified using RBS, EDS and XRD techniques, were also tested with confirmation.

中文翻译：

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通过物理气相沉积技术制造碳背薄锡 (116Sn) 同位素靶

在核反应实验中，需要薄靶。在目前的工作中，使用物理气相沉积技术（优选用于薄膜制造）在碳背板上制备了 30 个 116Sn 薄靶，使用效率为 98%。使用基于扩散泵的涂布装置将碳背衬的靶薄膜与脱模剂一起沉积在特定基材上。使用α-能量损失和RBS技术验证了靶材的厚度，并且它们彼此吻合。使用 RBS、EDS 和 XRD 技术验证的目标纯度也经过确认测试。