A new approach is proposed in solving the problems of active near-field microwave probing of materials, objects and media. According to this approach, the probing near field is formed as a result of overlapping of the evanescent fields generating under the conditions of a frustrated total internal reflection in the gap between the major faces of two right-angle dielectric prisms. An object under study placed into this gap exerts a noticeable influence on the reflected radiation characteristics. On this basis, one can not only perform the object quality diagnostics, but also obtain the data on its material parameters. A schematic design of a nearfield interference microwave microscope is described, which implements the proposed approach. The results of test measurements under the conditions of diagnostics of metalized strips with breaks are presented.

中文翻译：

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近场干扰微波探测中受阻全内反射现象

提出了一种解决材料、物体和介质的有源近场微波探测问题的新方法。根据这种方法，探测近场是在两个直角介电棱镜的主面之间的间隙中受抑制的全内反射条件下产生的渐逝场重叠的结果。放置在该间隙中的研究对象会对反射辐射特性产生显着影响。在此基础上，不仅可以进行物体质量诊断，还可以获得其材料参数的数据。描述了近场干涉微波显微镜的示意图设计，它实现了所提出的方法。