Absolute densities of N atoms and N2(A) molecules and estimated densities of H atoms and N2(X,v > 13) and NH molecules are determined in R(He,Ar)/x%(N2–5%H2) flowing microwave discharges by a band intensity ratio method after calibration of the N atom density by NO titration. By varying the plasma parameters: pressure of 8 and 4 Torr, flow rates of 0.5, 1.0 and 2.0 slpm, HF power up to 150 W, a high N + N recombination fraction (> 80%) has been observed with He dilution in the early afterglow (t = 5 × 10–3 s). A maximum value of the H-atom density has been found in the He/2%(N2–5%H2) gas mixture at 8 Torr, 0.5 slpm and 150 W, with a [H]/[N] ratio of 0.3. With Ar dilution, it is found that the Ar/5%(N2–5%H2) gas mixture at 4 Torr, 0.5 slpm, 100 W brought a high H2 dissociation (80%), with a [H]/[N] ratio of about 0.6. From the variation of the H-atom density along the quartz tube, the wall destruction probability of the H-atoms was calculated to be γHHe\documentclass[12pt]{minimal} \usepackage{amsmath} \usepackage{wasysym} \usepackage{amsfonts} \usepackage{amssymb} \usepackage{amsbsy} \usepackage{mathrsfs} \usepackage{upgreek} \setlength{\oddsidemargin}{-69pt} \begin{document}$${\gamma }_{H}^{He}$$\end{document} = γHAr\documentclass[12pt]{minimal} \usepackage{amsmath} \usepackage{wasysym} \usepackage{amsfonts} \usepackage{amssymb} \usepackage{amsbsy} \usepackage{mathrsfs} \usepackage{upgreek} \setlength{\oddsidemargin}{-69pt} \begin{document}$${\gamma }_{H}^{Ar}$$\end{document} = (1–4) × 10–3 in helium and argon mixtures. Such results are of interest for the enhancement of surface nitriding by the combined effects of N and H atoms inclusion inside a TiO2 surface.

中文翻译：

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R(He,Ar)/x%(N2–5%H2) 早期余辉中的高 H 原子密度

N 原子和 N2(A) 分子的绝对密度以及 H 原子和 N2(X,v > 13) 和 NH 分子的估计密度在 R(He,Ar)/x%(N2–5%H2) 流动微波中确定通过 NO 滴定校准 N 原子密度后，通过带强度比法放电。通过改变等离子体参数：8 和 4 Torr 的压力，0.5、1.0 和 2.0 slpm 的流速，高达 150 W 的 HF 功率，在 He 稀释的情况下观察到高 N + N 复合分数（> 80%）早期余辉（t = 5 × 10–3 s）。在 8 Torr、0.5 slpm 和 150 W 的 He/2%(N2–5%H2) 气体混合物中发现了 H 原子密度的最大值，[H]/[N] 比值为 0.3。通过 Ar 稀释，发现 4 Torr、0.5 slpm、100 W 的 Ar/5%(N2–5%H2) 气体混合物带来了高 H2 离解 (80%)，具有 [H]/[N] 0.6左右的比例。