The thickness of an ultrathin blocking layer for anodic aluminum oxide (AAO)-supported thin-film solid oxide fuel cells is determined. The atomic layer-deposited (ALD) ultrathin yttria-stabilized zirconia (YSZ) blocking layer for gadolinia-doped ceria (GDC) electrolyte cell is deposited on 300 nm-thick Pt anode-coated AAO substrates. The surface of AAO substrates is examined to be non-uniform in terms of pore size and bump inclination by field emission scanning electron microscopic analysis. While the average pore size is 130 nm, the pore size ranges from 36 to 207 nm. While the average slope angle is 42°, the slope angle ranges from 9° to 79°. A growth modelling result considering the pore sizes and the slope angles presents that highly reliable ALD-deposited YSZ blocking layers need to be thicker than 93 nm. This prediction well corresponds to the evolution of open circuit voltages for 400 nm-thick GDC electrolyte cells with 60 nm-thick and 120 nm-thick ALD-deposited YSZ blocking layers.

确定用于阳极氧化铝（AAO）的薄膜固体氧化物燃料电池的超薄阻挡层的厚度。用于氧化ado掺杂二氧化铈（GDC）电解质电池的原子层沉积（ALD）超薄氧化钇稳定化氧化锆（YSZ）阻挡层沉积在300 nm厚的Pt阳极涂覆的AAO衬底上。通过场发射扫描电子显微镜分析，检查了AAO基板的表面在孔径和凸点倾斜方面是不均匀的。当平均孔径为130nm时，孔径范围为36至207nm。当平均倾斜角为42°时，倾斜角的范围为9°至79°。考虑孔隙尺寸和倾斜角度的生长模型结果表明，高度可靠的ALD沉积YSZ阻挡层必须大于93 nm。