Abstract

The review is devoted to the modern methods of local maskless electrochemical machining of metals and semiconductors with the aim of formation of individual islands or cavities, their groups, and patterns according to a given program on their surface, or 3D micro/nanostructures, for example, metal threads and various thread structures. For this purpose, various methods of localizing the electrochemical deposition, dissolution, or oxidation are used.

中文翻译：

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金属和半导体的电化学局部无掩模微/纳米沉积，溶解和氧化（综述）

摘要

这篇综述专门针对金属和半导体的局部无掩模电化学加工的现代方法，目的是根据给定程序在其表面或3D微米/纳米结构上形成单个岛或腔，它们的组和图案。 ，金属螺纹和各种螺纹结构。为此，使用了各种方法来定位电化学沉积，溶解或氧化。