Graphene oxide (GO) synthesized according to the modified Hummers method was reduced by supercritical isopropyl alcohol (SCI), supercritical acetone (SCA), and supercritical water (SCW). Methods free of toxic reducing agents were developed for the graphene production. The composition, morphology, and structure of synthesized graphene were determined using CHN analysis, XRD, Raman spectroscopy, and scanning electron microscopy. The best results were acquired in the case of GO reduction in SCA and SCI at high parameters.

中文翻译：

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氧化石墨烯在超临界介质中的转化

根据改进的 Hummers 方法合成的氧化石墨烯 (GO) 被超临界异丙醇 (SCI)、超临界丙酮 (SCA) 和超临界水 (SCW) 还原。开发了无毒性还原剂的石墨烯生产方法。使用 CHN 分析、XRD、拉曼光谱和扫描电子显微镜确定合成石墨烯的组成、形态和结构。在高参数下 SCA 和 SCI 中 GO 减少的情况下获得了最好的结果。