For the accuracy of experimental results, preparing a high quality polished surface and cross-section of the materials for further analysis using electron back-scattered diffraction (EBSD), electron probe microanalysis (EPMA), and scanning probe microscopy (SPM) is extremely important. Broad ion beam (BIB) polishing, a method based on the principle of ion bombardment, has irreplaceable advantages. It makes up for the drawbacks and limitations of traditional polishing methods such as mechanical polishing, electrochemical polishing, and chemical polishing. The ions will not leave the bombardment area during polishing, which makes the BIB method suitable for porous materials. The energy of the ion beam can be adjusted according to the sample to reduce the deformation and strain of the polishing area, especially for fragile, soft, and hard materials. The conditions that need to be controlled during BIB polishing are simple. This paper demonstrated the unique advantages of BIB polishing technology in porous, layered and powder materials characterization through some typical application examples, and guided more researchers to understand and utilize BIB polishing technology in the development of new applications.

为了确保实验结果的准确性，使用电子背散射衍射（EBSD），电子探针微分析（EPMA）和扫描探针显微镜（SPM）制备高质量的抛光表面和横截面以进行进一步分析非常重要。基于离子轰击原理的宽离子束（BIB）抛光具有无可替代的优势。它弥补了传统抛光方法（如机械抛光，电化学抛光和化学抛光）的缺点和局限性。离子在抛光过程中不会离开轰击区域，这使BIB方法适用于多孔材料。可以根据样品调整离子束的能量，以减少抛光区域的变形和应变，特别是对于易碎，柔软和坚硬的材料。在BIB抛光期间需要控制的条件很简单。本文通过一些典型的应用实例展示了BIB抛光技术在多孔，层状和粉末材料表征中的独特优势，并指导更多的研究人员在开发新应用时了解和利用BIB抛光技术。