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Pb Monolayer Mediated Thin Film Growth of Cu and Co: Exploring Different Concepts
Journal of The Electrochemical Society ( IF 3.9 ) Pub Date : 2018-08-31 , DOI: 10.1149/2.0031901jes
D. Wu 1 , D. J. Solanki 1 , A. Joi 2 , Y. Dordi 2 , N. Dole 2 , D. Litvnov 1 , S. R. Brankovic 1
Affiliation  

We present results exploring different concepts for Pb monolayer mediated thin film growth of Cu on Ru(0001) and Co on polycrystalline Cu substrates. Both systems are of considerable importance in microchip fabrication technology and they exhibit a three dimensional growth at room temperature which somewhat limits their application. The Pb monolayer mediation of the growth process is explored by having its role as a surfactant, flux mediator or as a sacrificial layer in deposition via surface limited redox replacement protocol. Electrochemical and STM results suggest that Pb monolayer induces 2D Cu growth on Ru(0001) and the growth mechanism is very dependent on the Pb mediation role. The surfactant properties of electrolessly deposited Pb monolayer are also studied during electroless deposition of Co on polycrystalline Cu. The benefit of Pb monolayer mediation of the Co growth process was manifested by 2D Co thin film morphology, high quality of the grain boundaries, and improved magnetic properties. © The Author(s) 2018. Published by ECS. This is an open access article distributed under the terms of the Creative Commons Attribution 4.0 License (CC BY, http://creativecommons.org/licenses/by/4.0/), which permits unrestricted reuse of the work in any medium, provided the original work is properly cited. [DOI: 10.1149/2.0031901jes]

中文翻译:

Pb 单层介导 Cu 和 Co 的薄膜生长:探索不同的概念

我们展示了探索在 Ru(0001) 上和多晶铜基板上的 Co 上的 Pb 单层介导的薄膜生长的不同概念的结果。这两种系统在微芯片制造技术中都具有相当重要的意义,并且它们在室温下表现出三维生长,这在一定程度上限制了它们的应用。铅单层介导的生长过程是通过其作为表面活性剂、通量介体或通过表面有限氧化还原置换协议在沉积中作为牺牲层的作用来探索的。电化学和 STM 结果表明,Pb 单层诱导 Ru(0001) 上的 2D Cu 生长,并且生长机制非常依赖于 Pb 介导作用。在多晶铜上无电沉积 Co 期间,还研究了无电沉积 Pb 单层的表面活性剂特性。Pb 单层介导 Co 生长过程的好处体现在 2D Co 薄膜形态、高质量的晶界和改进的磁性能上。© The Author(s) 2018. 由 ECS 出版。这是一篇根据知识共享署名 4.0 许可(CC BY,http://creativecommons.org/licenses/by/4.0/)条款分发的开放获取文章,它允许在任何媒体中不受限制地重复使用作品,前提是原始作品被正确引用。[DOI: 10.1149/2.0031901jes] org/licenses/by/4.0/),它允许在任何媒体中不受限制地重复使用作品,前提是原始作品被正确引用。[DOI: 10.1149/2.0031901jes] org/licenses/by/4.0/),它允许在任何媒体中不受限制地重复使用作品,前提是原始作品被正确引用。[DOI: 10.1149/2.0031901jes]
更新日期:2018-08-31
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