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Chemically-biased diffusion and segregation impede void growth in irradiated Ni-Fe alloys
Current Opinion in Solid State & Materials Science ( IF 12.2 ) Pub Date : 2018-12-24 , DOI: 10.1016/j.cossms.2018.12.001
Alexander Barashev , Yuri Osetsky , Hongbin Bei , Chenyang Lu , Lumin Wang , Yanwen Zhang

Recent irradiations of Ni-Fe concentrated solid solution alloys have demonstrated significant improvement of radiation performance. This improvement is attributed to redistribution of the alloying elements near sinks of point defects (voids, dislocations) due to chemically-biased atomic diffusion, where vacancies have preference to migrate via Fe atoms and interstitials via Ni atoms. In Ni-Fe, all sinks are enriched by Ni atoms, which strongly affects further interactions of radiation-produced mobile defects with voids and dislocations, hence void growth and dislocation climb. Ni-decorated sinks interact stronger with interstitial atoms than vacancies, which enhances dislocation loops growth. At the same time, Ni segregation creates Fe-enriched “channels” for vacancy migration out of the damage region to agglomerate in the outer regions, inaccessible to interstitial atoms. Strong effect of chemically-biased diffusion is supported by transmission electron microscope characterization and calls for special attention in designing alloys with desired properties through tuning defect mobilities.



中文翻译:

化学偏置的扩散和偏析会阻碍辐照的镍铁合金中的空洞生长

Ni-Fe浓缩固溶合金最近的辐照已显示出辐射性能的显着改善。这种改善归因于由于化学偏向的原子扩散,合金元素在点缺陷(空位,位错)的汇点附近的重新分布,其中空位优先通过Fe原子迁移,并且间隙通过Ni原子迁移。在Ni-Fe中,所有的汇都被Ni原子富集,这强烈影响了辐射产生的移动缺陷与空位和位错的进一步相互作用,因此空位生长和位错爬升。镍装饰的沉与间隙原子的相互作用比空位更强,从而增强了位错环的生长。同时,镍的偏析会形成富铁的“通道”,从而使空位迁移到损伤区域之外,从而在外部聚集。间隙原子无法访问。透射电子显微镜表征支持了化学偏置扩散的强大作用,并在通过调节缺陷迁移率设计具有所需性能的合金时需要特别注意。

更新日期:2018-12-24
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