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Dewetting mechanisms and their exploitation for the large-scale fabrication of advanced nanophotonic systems
International Materials Reviews ( IF 16.8 ) Pub Date : 2018-12-18 , DOI: 10.1080/09506608.2018.1543832
Jongpil Ye 1 , Dmitry Zuev 2 , Sergey Makarov 2
Affiliation  

Recent progress in submicron- and nano-fabrication technologies has led to the emergence of novel photonic structures such as optical nanoantennas and metasurfaces. Real-life applications of these advanced photonic structures still require substantial improvement of the fabrication processes, in terms of their throughput and cost-effectiveness. Because of its simplicity and effectiveness, dewetting of a thin film has attained increasing attention as a feasible process for improving the scalability and productivity. Here, we provide an overview of the mechanisms and phenomenologies of dewetting to foster an improved fundamental understanding necessary for the optimisation of the dewetting process condition and template design. We then review the strategies demonstrating the use of templated-dewetting for producing well-aligned arrays of submicron- and nanostructures with great control over their size, shape and arrangement. Recent applications of dewetted structures in advanced nanophotonics are reviewed with an emphasis on the exploitation of dewetting mechanisms. Special attention is given to the fabrication of resonant optical nanoantennas and nanophotonic applications in which high repeatability and throughput are important parameters: sensing, colourisation, photovoltaics and nonlinear light frequency conversion. We expect this review to provide a basis for the use of thin-film dewetting to realise the industrial-level fabrication of various practical advanced photonic systems.

中文翻译:

大规模制造先进纳米光子系统的去湿机理及其开发

亚微米和纳米制造技术的最新进展导致出现了新颖的光子结构,例如光学纳米天线和超颖表面。这些先进的光子结构的实际应用仍需要在生产能力和成本效率方面进行实质性的改进。由于其简单性和有效性,薄膜的去湿作为提高可扩展性和生产率的可行方法而受到越来越多的关注。在这里,我们概述了去湿的机理和现象学,以增进对去湿工艺条件和模板设计的优化所必需的改进的基本理解。然后,我们回顾了证明使用模板去湿法来生产亚微米和纳米结构排列良好的阵列的策略,这些阵列可很好地控制其尺寸,形状和排列。综述了去湿结构在高级纳米光子学中的最新应用,重点是去湿机理的开发。特别注意谐振光学纳米天线的制造和纳米光子应用,其中高重复性和吞吐量是重要参数:传感,着色,光电和非线性光频率转换。我们希望这次审查为使用薄膜去湿技术实现各种实用的先进光子系统的工业水平制造提供基础。综述了去湿结构在高级纳米光子学中的最新应用,重点是去湿机理的开发。特别注意谐振光学纳米天线的制造和纳米光子应用,其中高重复性和吞吐量是重要的参数:传感,着色,光电和非线性光频率转换。我们希望这次审查为使用薄膜去湿技术实现各种实用的先进光子系统的工业水平制造提供基础。综述了去湿结构在高级纳米光子学中的最新应用,重点是去湿机理的开发。特别注意谐振光学纳米天线的制造和纳米光子应用,其中高重复性和吞吐量是重要参数:传感,着色,光电和非线性光频率转换。我们希望这次审查为使用薄膜去湿技术实现各种实用的先进光子系统的工业水平制造提供基础。特别注意谐振光学纳米天线的制造和纳米光子应用,其中高重复性和吞吐量是重要参数:传感,着色,光电和非线性光频率转换。我们希望这次审查为使用薄膜去湿技术实现各种实用的先进光子系统的工业水平制造提供基础。特别注意谐振光学纳米天线的制造和纳米光子应用,其中高重复性和吞吐量是重要参数:传感,着色,光电和非线性光频率转换。我们希望这次审查为使用薄膜去湿技术实现各种实用的先进光子系统的工业水平制造提供基础。
更新日期:2018-12-18
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