Polyelemental Nanolithography via Plasma Ion Bombardment: From Fabrication to Superior H2 Sensing Application,Advanced Materials

当前位置： X-MOL 学术 › Adv. Mater. › 论文详情

Our official English website, www.x-mol.net, welcomes your feedback! (Note: you will need to create a separate account there.)

Polyelemental Nanolithography via Plasma Ion Bombardment: From Fabrication to Superior H2 Sensing Application
Advanced Materials ( IF 27.4 ) Pub Date : 2018-12-14 , DOI: 10.1002/adma.201805343
Woo‐Bin Jung _{1,

2} , Soo‐Yeon Cho _{1,

2} , Bong Lim Suh ₁ , Hae‐Wook Yoo ₃ , Hwan‐Jin Jeon ₄ , Jihan Kim ₁ , Hee‐Tae Jung _{1,

2}

Affiliation

The development of complex nanostructures containing a homo‐ and heteromixture of two or more metals is a considerable challenge in nanotechnology. However, previous approaches are considerably limited to the number of combinations of metals depending on the compatibility of elements, and to the complex shape control of the nanostructure. In this study, a significant step is taken toward resolving these limitations via the utilization of a low‐energy argon‐ion bombardment. The multilayer films are etched and re‐sputtered on the sidewall of the pre‐pattern, which is a secondary sputtering phenomenon. In contrast to the precursor mixing method, most metallic combinations can be fabricated. The degree of mixing is tuned by the control of the sequence and thickness of multilayers. In addition, the feature shape and dimensions are controlled by changing the pre‐pattern or by controlling the ion‐beam angle. Using this method, the shortest response time (2 s to 1% H₂) in comparison with those of Pd‐based H₂ sensors reported previously and a limit of detection below 1 parts per million (ppm) for Pd/Au and Pd/Pt bimetallic line arrays are achieved. This study is expected to realize a family of polyelements that can be used in various applications.

中文翻译：

通过等离子离子轰击进行的聚元素纳米光刻：从制造到卓越的H2传感应用

包含两种或多种金属的均相和异相混合物的复杂纳米结构的发展在纳米技术中是一项巨大的挑战。然而，根据元素的相容性，先前的方法明显地限于金属的组合数量，并且受限于纳米结构的复杂形状控制。在这项研究中，通过利用低能氩离子轰击来解决这些局限性，迈出了重要的一步。在预图案的侧壁上蚀刻并重新溅射多层膜，这是次要的溅射现象。与前驱体混合方法相反，可以制造大多数金属组合。通过控制多层的顺序和厚度来调节混合程度。此外，通过更改预图案或通过控制离子束角度来控制特征形状和尺寸。使用此方法，响应时间最短（2 s至1％H₂）与先前报道的基于Pd的H ₂传感器相比，Pd / Au和Pd / Pt双金属线阵列的检出限低于百万分之一（ppm）。预期该研究将实现可用于各种应用的多元素家族。

更新日期：2018-12-14

点击分享查看原文

点击收藏

阅读更多本刊最新论文本刊介绍/投稿指南11