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2D Metal Chalcogenide Nanopatterns by Block Copolymer Lithography
Advanced Functional Materials ( IF 18.5 ) Pub Date : 2018-10-16 , DOI: 10.1002/adfm.201804508 Taeyeong Yun 1 , Hyeong Min Jin 1 , Dong‐Ha Kim 2 , Kyu Hyo Han 1 , Geon Gug Yang 1 , Gil Yong Lee 1 , Gang San Lee 1 , Jin Young Choi 1 , Il‐Doo Kim 2 , Sang Ouk Kim 1
Advanced Functional Materials ( IF 18.5 ) Pub Date : 2018-10-16 , DOI: 10.1002/adfm.201804508 Taeyeong Yun 1 , Hyeong Min Jin 1 , Dong‐Ha Kim 2 , Kyu Hyo Han 1 , Geon Gug Yang 1 , Gil Yong Lee 1 , Gang San Lee 1 , Jin Young Choi 1 , Il‐Doo Kim 2 , Sang Ouk Kim 1
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Nanoscale structure engineering is in high demand for various applications of 2D transition metal dichalcogenides (TMDs). An edge‐exposed 2D polycrystalline MoS2 nanomesh thin film is demonstrated via block copolymer (BCP) nanopatterning. Molybdenum nanomesh structure is formed by direct metal deposition of hexagonal cylinder BCP nanotemplate and the following lift‐off process. Subsequent sulfurization of the molybdenum nanomesh creates MoS2 nanomesh thin films without any degradative etching step. The approach is applicable to not only other metal sulfides and oxides but also other nanoscale structures of TMD thin films including nanodot and nanowire array by means of various BCP nanotemplate shapes. As the edge site of MoS2 is highly active for NO2 sensing, the edge‐exposed MoS2 nanomesh demonstrates sevenfold enhancement of sensitivity for NO2 molecules compared to uniform thin film as well as superior reversibility even under 80% relative humidity environment. This structure engineering method could greatly strengthen the potential application of 2D TMD materials with the optimal customized nanoscale structures.
中文翻译：
嵌段共聚物光刻技术制备二维金属硫属化物纳米图案
纳米级结构工程对2D过渡金属二卤化金属（TMD）的各种应用有很高的要求。通过嵌段共聚物（BCP）纳米构图展示了边缘暴露的2D多晶MoS 2纳米网状薄膜。钼纳米网状结构是通过六角圆柱BCP纳米模板的直接金属沉积和随后的剥离工艺形成的。随后钼纳米网的硫化产生了MoS 2纳米网薄膜，而没有任何降解性的蚀刻步骤。该方法不仅适用于其他金属硫化物和氧化物，而且适用于TMD薄膜的其他纳米级结构，包括借助各种BCP纳米模板形状的纳米点和纳米线阵列。由于MoS 2的边缘部位对NO的活性很高通过2感测，边缘暴露的MoS 2纳米筛网显示出与均匀薄膜相比，NO 2分子的灵敏度提高了七倍，即使在80％相对湿度环境下，其可逆性也非常好。这种结构工程方法可以极大地增强具有最佳定制纳米级结构的二维TMD材料的潜在应用。
更新日期：2018-10-16
中文翻译：
嵌段共聚物光刻技术制备二维金属硫属化物纳米图案
纳米级结构工程对2D过渡金属二卤化金属（TMD）的各种应用有很高的要求。通过嵌段共聚物（BCP）纳米构图展示了边缘暴露的2D多晶MoS 2纳米网状薄膜。钼纳米网状结构是通过六角圆柱BCP纳米模板的直接金属沉积和随后的剥离工艺形成的。随后钼纳米网的硫化产生了MoS 2纳米网薄膜，而没有任何降解性的蚀刻步骤。该方法不仅适用于其他金属硫化物和氧化物，而且适用于TMD薄膜的其他纳米级结构，包括借助各种BCP纳米模板形状的纳米点和纳米线阵列。由于MoS 2的边缘部位对NO的活性很高通过2感测，边缘暴露的MoS 2纳米筛网显示出与均匀薄膜相比，NO 2分子的灵敏度提高了七倍，即使在80％相对湿度环境下，其可逆性也非常好。这种结构工程方法可以极大地增强具有最佳定制纳米级结构的二维TMD材料的潜在应用。
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