Large-area manufacturing of flexible nanoscale electronics has long been sought by the printed electronics industry. However, the lack of a robust, reliable, high throughput and low-cost technique that is capable of delivering high-performance functional devices has hitherto hindered commercial exploitation. Herein we report on the extensive range of capabilities presented by adhesion lithography (a-Lith), an innovative patterning technique for the fabrication of coplanar nanogap electrodes with arbitrarily large aspect ratio. We use this technique to fabricate a plethora of nanoscale electronic devices based on symmetric and asymmetric coplanar electrodes separated by a nanogap < 15 nm. We show that functional devices including self-aligned-gate transistors, radio frequency diodes and rectifying circuits, multi-colour organic light-emitting nanodiodes and multilevel non-volatile memory devices, can be fabricated in a facile manner with minimum process complexity on a range of substrates. The compatibility of the formed nanogap electrodes with a wide range of solution processable semiconductors and substrate materials renders a-Lith highly attractive for the manufacturing of large-area nanoscale opto/electronics on arbitrary size and shape substrates.

印刷电子行业一直在寻求大面积制造柔性纳米级电子产品。然而，迄今为止，缺乏能够提供高性能功能设备的可靠，可靠，高通量和低成本的技术阻碍了商业开发。本文中，我们报告了由粘附光刻技术（a-Lith）提供的广泛功能，粘附光刻技术是一种新颖的构图技术，用于制造纵横比较大的共面纳米间隙电极。我们使用这项技术来制造大量的纳米级电子设备，这些设备基于被小于15 nm的纳米间隙隔开的对称和不对称共面电极。我们展示了功能器件，包括自对准栅晶体管，射频二极管和整流电路，多色有机发光纳米二极管和多级非易失性存储器件可以在一系列衬底上以最小的工艺复杂性来方便地制造。所形成的纳米间隙电极与各种可溶液处理的半导体和基板材料的相容性使a-Lith在任意尺寸和形状的基板上制造大面积纳米级光电/电子产品方面具有很高的吸引力。