Abstract Amorphous carbon films with perfect corrosion resistance have attracted scientific interest for years, but the corrosion behaviors of these films under heat shock conditions have rarely been reported. To reveal these behaviors, the corrosion properties of hydrogenated amorphous carbon (a-C:H) films at temperature of 200–400 °C are evaluated by Electrochemical tests and the variation of its structure detected via Raman spectroscopy, X-ray photoelectron spectroscopy, high resolution transmission electron microscopy and scanning electron microscopy. Under all inspected temperatures, the corrosion properties of the films are better than those of bare silicon due to the chemical inertness of the a-C:H films. In detailed, the corrosion properties improve with increasing temperature up to 250 °C, because of the densification and crystallization of the a-C:H films. Above 250 °C, the corrosion properties weakened a litter as the temperature increased, which can be attributed graphitization induced porosity and promoted the number of ion channels. In a word, the films that annealed at a temperature of 250 °C have optimal corrosion resistance. Interestingly, the surface energy of a-C:H films has little effect on corrosion behaviors. Our result shows that the a-C:H films have superior corrosion resistance even under heat shock conditions.

中文翻译：

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通过退火揭示无定形碳膜在热冲击下的耐腐蚀性

摘要 多年来，具有完美耐腐蚀性能的非晶碳薄膜引起了科学界的兴趣，但这些薄膜在热冲击条件下的腐蚀行为鲜有报道。为了揭示这些行为，通过电化学测试评估了氢化非晶碳 (aC:H) 膜在 200-400 °C 的腐蚀性能，并通过拉曼光谱、X 射线光电子能谱、高分辨率检测其结构的变化。透射电子显微镜和扫描电子显微镜。在所有检测温度下，由于 aC:H 薄膜的化学惰性，薄膜的腐蚀性能优于裸硅。详细地说，随着温度升高到 250 °C，腐蚀性能会提高，由于 aC:H 薄膜的致密化和结晶化。在 250 °C 以上，随着温度的升高，腐蚀性能减弱，这可以归因于石墨化引起的孔隙率并增加了离子通道的数量。总之，在250°C的温度下退火的薄膜具有最佳的耐腐蚀性。有趣的是，aC:H 薄膜的表面能对腐蚀行为几乎没有影响。我们的结果表明，即使在热冲击条件下，aC:H 薄膜也具有优异的耐腐蚀性。有趣的是，aC:H 薄膜的表面能对腐蚀行为几乎没有影响。我们的结果表明，即使在热冲击条件下，aC:H 薄膜也具有优异的耐腐蚀性。有趣的是，aC:H 薄膜的表面能对腐蚀行为几乎没有影响。我们的结果表明，即使在热冲击条件下，aC:H 薄膜也具有优异的耐腐蚀性。