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Construction of DyVO4/nitrogen deficient g-C3N4 composite for enhanced visible-light photocatalytic activity for tetracycline degradation
Materials Research Bulletin ( IF 5.3 ) Pub Date : 2020-04-01 , DOI: 10.1016/j.materresbull.2020.110766
Keke Shu , Fangyan Chen , Weilong Shi , Feng Guo , Yubin Tang , Hongji Ren , Mingyang Li

Abstract The defects engineering takes effects on regulating the electronic structure to enhance the optical absorption, and acting as the capture centers of charge carriers to hinder the recombination of electron hole pairs. In this work, DyVO4/nitrogen deficient g-C3N4 (DVO/CNx) composite photocatalysts were successfully synthesized by a simple precipitation-calcination method, which showed excellent visible-light photocatalytic activity for the degradation of tetracycline (TC). Among them, 10 % DVO/CNx (with the mass ratio of 10 % DVO in the composites) exhibited the optimum photocatalytic performance (within 1 h, 92 % degradation of TC), which was higher than pure phase materials (CN, CNx and DVO) and DVO/CN heterojunction photocatalyst. The dramatically enhanced photocatalytic activity of DVO/CNx composite can be ascribed to its defect structure and the construction of heterojunction, which can simultaneously improve the visible-light absorption and separation efficiency of photo-generated electron-hole pairs. More importantly, the DVO/CNx photocatalyst exhibits high stability and reusability.

中文翻译:

构建 DyVO4/缺氮 g-C3N4 复合材料以增强可见光光催化降解四环素的活性

摘要 缺陷工程的作用是调节电子结构以增强光吸收,并作为电荷载流子的俘获中心阻碍电子空穴对的复合。在这项工作中,通过简单的沉淀-煅烧方法成功合成了 DyVO4/缺氮 g-C3N4(DVO/CNx)复合光催化剂,该催化剂对四环素(TC)的降解表现出优异的可见光光催化活性。其中,10% DVO/CNx(复合材料中DVO质量比为10%)表现出最佳光催化性能(1小时内,TC降解92%),高于纯相材料(CN、CNx和DVO) 和 DVO/CN 异质结光催化剂。DVO/CNx复合材料显着增强的光催化活性可归因于其缺陷结构和异质结的构建,可以同时提高光生电子-空穴对的可见光吸收和分离效率。更重要的是,DVO/CNx 光催化剂表现出高稳定性和可重复使用性。
更新日期:2020-04-01
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