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The effects of deposition conditions on hydrogenation, hardness and elastic modulus of W-C:H coatings
Journal of the European Ceramic Society ( IF 5.8 ) Pub Date : 2019-12-31 , DOI: 10.1016/j.jeurceramsoc.2019.12.062
František Lofaj , Margita Kabátová , Lenka Kvetková , Jozef Dobrovodský

The additions of C2H2, CH4 and H2 in hybrid PVD-PECVD of W-C:H coatings deposited using High Power Impulse Magnetron Sputtering (HiPIMS) and High Target Utilization Sputtering (HiTUS) were investigated to determine their effects on the content and chemical composition of the amorphous carbon-based boundary phase and mechanical properties of the coatings. Substantial differences were observed: CH4 always produced higher concentrations of hydrogen and lower concentrations of carbon than C2H2 and HiPIMS resulted in higher contents of amorphous carbon-based boundary phase and higher levels of its hydrogenation than HiTUS. The detrimental effects of higher carbon and hydrogen contents in the boundary phase on hardness and indentation modulus were attributed to the consumption of Csingle bondC bonds by Csingle bondH bonds during hydrogenation and reduction of cross-linking of the polymeric network in the boundary phase. The HiPIMS W-C:H coatings deposited with acetylene and hydrogen exhibited medium (∼20 GPa) hardness and elastic modulus (200–220 GPa) with HIT/EIT > 0.1 suggesting improved toughness and wear resistance. These properties were attributed to the optimum combination of hydrogenation, hybridization and cross linking in the carbon-based boundary phase.



中文翻译:

沉积条件对WC:H涂层氢化,硬度和弹性模量的影响

研究了使用高功率脉冲磁控溅射(HiPIMS)和高目标利用溅射(HiTUS)沉积的WC:H涂层的混合PVD-PECVD中C 2 H 2,CH 4和H 2的添加,以确定它们对含量的影响非晶碳基边界相的化学组成和涂层的机械性能。观察到明显的差异:与C 2 H 2相比,CH 4总是产生更高的氢浓度和更低的碳浓度。和HiPIMS相比,HiTUS导致非晶碳基界面相的含量更高,并且其氢化程度更高。边界相中较高的碳和氢含量对硬度和压痕模量的不利影响归因于氢化过程中单键C 单键H键消耗C C键,以及边界相中聚合物网络的交联减少。沉积有乙炔和氢气的HiPIMS WC:H涂层具有H IT / E IT中等硬度(〜20 GPa)和弹性模量(200–220 GPa)> 0.1表示韧性和耐磨性得到改善。这些性质归因于在基于碳的边界相中氢化,杂交和交联的最佳组合。

更新日期:2019-12-31
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