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Combined wet lithography and fractional precipitation as a tool for fabrication of spatially controlled nanostructures of poly(3-hexylthiophene) ordered aggregates.
Nanoscale ( IF 6.7 ) Pub Date : 2020-01-08 , DOI: 10.1039/c9nr10057a
Lorena Di Silvio 1 , Eugenio Lunedei , Denis Gentili , Marianna Barbalinardo , Ilse Manet , Silvia Milita , Fabiola Liscio , Alessandro Fraleoni-Morgera , Massimiliano Cavallini
Affiliation  

Herein, we propose an easy and practical method for the fabrication of highly ordered supramolecular structures. The proposed approach combines fractional precipitation and wet lithography, to obtain a spatially-defined pattern of submicrometric structures with a high molecular order of poly(3-hexylthiophene). The process is demonstrated by XRD, confocal and time-resolved spectroscopy and by the performance of an effective field effect transistor.

中文翻译:

结合湿法光刻和部分沉淀作为制造聚(3-己基噻吩)有序聚集体的空间控制纳米结构的工具。

在这里,我们提出了一种简单而实用的方法来制造高度有序的超分子结构。所提出的方法结合了部分沉淀和湿法光刻技术,以获得具有高分子级聚(3-己基噻吩)的亚微米结构的空间定义图案。XRD,共聚焦和时间分辨光谱以及有效场效应晶体管的性能证明了这一过程。
更新日期:2020-01-08
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