This work presents the study of morphology and thermal properties of thin ZnO films fabricated by atomic layer deposition. The layers were deposited on n-Si(100) wafers at 200 °C. X-ray diffraction measurements showed the polycrystalline structure of the thin films with preferred (100) orientation. The thinner ZnO layers were fine grained, while the thicker films were formed with larger, elongated grains. Surface morphology parameters and the thermal conductivities were obtained from microscopic measurements. Thermal properties correlated with surface roughness of the ZnO thin films. Variations in thermal conductivity followed the changes in morphology of the layers. The mean surface roughness depended on the number of deposition cycles and varied from 1.1-2.6 nm. Thermal conductivity varied from 0.28 to 4.29 Wm-1K-1 and increased also with an increase of average crystallite size. The possible correlations between electrical conductivity and thermal conductivity were also analyzed. The phonon contribution to total thermal conductivity dominates over the electron thermal conductivity.

中文翻译：

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原子层沉积法生长的 ZnO 薄膜的形貌和热性能的显微研究

这项工作介绍了通过原子层沉积制造的 ZnO 薄膜的形态和热性能研究。这些层在 200 °C 下沉积在 n-Si(100) 晶片上。X 射线衍射测量显示薄膜的多晶结构具有优选的 (100) 取向。较薄的 ZnO 层是细晶粒，而较厚的薄膜则形成较大的细长晶粒。表面形态参数和热导率是通过显微镜测量获得的。热性能与 ZnO 薄膜的表面粗糙度相关。热导率的变化跟随层的形态变化。平均表面粗糙度取决于沉积循环次数，范围为 1.1-2.6 nm。热导率从 0.28 到 4 不等。29 Wm-1K-1 并且随着平均微晶尺寸的增加而增加。还分析了电导率和导热率之间可能的相关性。声子对总热导率的贡献优于电子热导率。