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Sub-10 nm Feature Sizes of Disordered Polystyrene-block-poly(methyl methacrylate) Copolymer Films Achieved by Ionic Liquid Additives with Selectively Distributed Charge Interactions
ACS Applied Polymer Materials ( IF 4.4 ) Pub Date : 2020-01-08 , DOI: 10.1021/acsapm.9b00898 Shuangjun Chen 1 , Guangpeng Wu 2 , Xiaoliang Wang 3 , Xuanxuan Chen 4 , Paul Nealey 4
ACS Applied Polymer Materials ( IF 4.4 ) Pub Date : 2020-01-08 , DOI: 10.1021/acsapm.9b00898 Shuangjun Chen 1 , Guangpeng Wu 2 , Xiaoliang Wang 3 , Xuanxuan Chen 4 , Paul Nealey 4
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Weak segregation of polystyrene-block-poly(methyl methacrylate) block copolymers (PS-b-PMMA BCPs) limits their utility for sub-10 nm lithography. Such limits could be overcome by including ionic liquids (ILs) as additives, which conveniently enhance the demixing between PS and PMMA blocks. Herein, we studied the distribution and interaction evolution of the ionic liquid 1-hexyl-3-methylimidazolium hexafluorophosphate (HMHF) in PS-b-PMMA BCPs. The segmental dynamics of the rigid, intermediate, and mobile molecular components in PS-b-PMMA/HMHF was characterized by solid state nuclear magnetic resonance spectroscopy, and the results suggested a selective interaction between PMMA and HMHF. The surface energies and interfacial behaviors of the polymer/HMHF mixtures indicated that HMHF was distributed underneath the PMMA surface during heat treatment. Because of this distribution, disordered PS-b-PMMA with HMHF added formed perpendicular sub-10 nm features through thermal annealing. In addition, the effective interaction parameter (χeff) between PS and PMMA/HMHF was calculated from the domain periods of the BCPs. A parameter, ξIL, defined as the ratio of the Coulomb and Lennard-Jones interactions, was introduced to obtain self-consistent χeff values. The fitted ξIL values explained the dependence of χeff on molecular weight due to the dramatically enhanced charge effects for BCPs with low degrees of polymerization. The PS-b-PMMA BCPs still exhibited great compatibility with the later BCP lithography fabrication when using ionic liquid additives.
中文翻译：
具有选择性分布电荷相互作用的离子液体添加剂获得的无序聚苯乙烯嵌段-聚（甲基丙烯酸甲酯）共聚物薄膜的亚10 nm特征尺寸
聚苯乙烯-嵌段-聚（甲基丙烯酸甲酯）嵌段共聚物（PS- b - PMMA BCP）的弱偏析限制了其在低于10nm的光刻中的效用。通过包含离子液体（ILs）作为添加剂可以克服这些限制，这些离子液体可以方便地增强PS和PMMA嵌段之间的混合。在这里，我们研究了离子液体1-己基-3-甲基咪唑六氟磷酸盐（HMHF）在PS- b - PMMA BCP中的分布和相互作用。PS- b中刚性，中间和移动分子组分的分段动力学-PMMA / HMHF的特征在于固态核磁共振波谱，结果表明PMMA和HMHF之间有选择性的相互作用。聚合物/ HMHF混合物的表面能和界面行为表明，在热处理过程中，HMHF分布在PMMA表面之下。由于这种分布，通过热退火，添加了HMHF的无序PS- b -PMMA形成了垂直的亚10 nm特征。此外，有效的相互作用参数（χ EFF PS和PMMA / HMHF之间）从过境点的域间隔中计算出。一个参数，ξ IL，其定义为库仑和伦纳德-琼斯相互作用的比率，被引入以获得自洽χ EFF值。拟合的ξIL值解释了χeff对分子量的依赖性，这是因为低聚合度BCP的电荷效应显着增强。当使用离子液体添加剂时，PS- b - PMMA BCP与后来的BCP光刻制造仍表现出很大的兼容性。
更新日期：2020-01-09
中文翻译：
具有选择性分布电荷相互作用的离子液体添加剂获得的无序聚苯乙烯嵌段-聚（甲基丙烯酸甲酯）共聚物薄膜的亚10 nm特征尺寸
聚苯乙烯-嵌段-聚（甲基丙烯酸甲酯）嵌段共聚物（PS- b - PMMA BCP）的弱偏析限制了其在低于10nm的光刻中的效用。通过包含离子液体（ILs）作为添加剂可以克服这些限制，这些离子液体可以方便地增强PS和PMMA嵌段之间的混合。在这里，我们研究了离子液体1-己基-3-甲基咪唑六氟磷酸盐（HMHF）在PS- b - PMMA BCP中的分布和相互作用。PS- b中刚性，中间和移动分子组分的分段动力学-PMMA / HMHF的特征在于固态核磁共振波谱，结果表明PMMA和HMHF之间有选择性的相互作用。聚合物/ HMHF混合物的表面能和界面行为表明，在热处理过程中，HMHF分布在PMMA表面之下。由于这种分布，通过热退火，添加了HMHF的无序PS- b -PMMA形成了垂直的亚10 nm特征。此外，有效的相互作用参数（χ EFF PS和PMMA / HMHF之间）从过境点的域间隔中计算出。一个参数，ξ IL，其定义为库仑和伦纳德-琼斯相互作用的比率，被引入以获得自洽χ EFF值。拟合的ξIL值解释了χeff对分子量的依赖性，这是因为低聚合度BCP的电荷效应显着增强。当使用离子液体添加剂时，PS- b - PMMA BCP与后来的BCP光刻制造仍表现出很大的兼容性。
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