Polycrystalline TiO2 thin films were deposited onto quartz substrates using RF magnetron sputtering technique at different substrate temperatures (573 K, 623 K, 673 K, and 773 K). X-ray diffraction (XRD) measurements revealed the isolation of anatase phase with (101) preferred crystal orientation for the film deposited at 773 K. Moreover, the topographical features of this film clarified the smoothness of the deposited films, with root mean square roughness (RMS) of 0.5 nm. The optical properties of the as-prepared thin films at different deposition temperatures was enlightened through structural correlation. Most of the films were transparent with transmittance intensity extending from 50 to 90% within the visible range. Due to the smoothness of the deposited films, the transmittance and reflectance spectra exhibited an oscillatory behavior. Additionally, from single effective oscillator model, the dispersion parameters were estimated. For the deposited films, the single oscillator energy (Eo), dispersion energy (Ed), lattice dielectric constant (eL), and infinite permittivity (e∞) extended in the range (3.42 ~ 3.99), (9.83 ~ 24.12), (4.39 ~ 7.75), and (3.88 ~ 7.04), respectively.

中文翻译：

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沉积温度对TiO2薄膜结构和分散参数的影响

在不同的衬底温度（573 K、623 K、673 K 和 773 K）下，使用射频磁控溅射技术将多晶 TiO2 薄膜沉积到石英衬底上。X 射线衍射 (XRD) 测量揭示了在 773 K 下沉积的薄膜分离出具有 (101) 优先晶体取向的锐钛矿相。此外，该薄膜的形貌特征阐明了沉积薄膜的光滑度，均方根粗糙度(RMS) 为 0.5 纳米。通过结构相关性揭示了在不同沉积温度下制备的薄膜的光学特性。大多数薄膜是透明的，在可见光范围内的透射强度从 50% 到 90% 不等。由于沉积薄膜的平滑性，透射率和反射率光谱表现出振荡行为。此外，从单个有效振荡器模型中，估计了色散参数。对于沉积薄膜，单振子能量（Eo）、色散能量（Ed）、晶格介电常数（eL）和无限介电常数（e∞）在范围（3.42~3.99）、（9.83~24.12）、（ 4.39 ~ 7.75) 和 (3.88 ~ 7.04)。