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Study on energy level bending at heterojunction of solution-processed phthalocyanine thin film and n-Si by Kelvin probe force microscopy
Organic Electronics ( IF 2.7 ) Pub Date : 2019-12-18 , DOI: 10.1016/j.orgel.2019.105599
Ryo Ishiura , Akihiko Fujii , Makoto Arita , Koichi Sudoh , Masanori Ozaki

Surface potential of a solution-processed thin film of an organic semiconductor, 1,4,8,11,15,18,22,25-octahexylphthalocyanine (C6PcH2), on n-type silicon (n-Si) substrate has been studied by using Kelvin probe force microscopy, and discussed the interface properties of organic/inorganic semiconductors. The molecular step and terrace structure was observed on the surface of solution-processed C6PcH2 thin film as a feature of the crystallites composed of C6PcH2 columns lying on the substrate. The surface potential changed depending on the distance from the interface, and exceeded 0.4 eV, which indicated the difference of Fermi levels between C6PcH2 and n-Si. The linear and non-linear relationships between the surface potential and the distance from the interface were discussed by taking the vacuum level shift and impurity carriers into consideration.



中文翻译:

用开尔文探针力显微镜研究固溶酞菁薄膜和n-Si异质结处的能级弯曲

研究了在n型硅(n-Si)衬底上对有机半导体1,4,8,11,15,18,22,25-辛己基酞菁(C6PcH 2)进行固溶处理后的薄膜的表面电势通过使用开尔文探针力显微镜,并讨论了有机/无机半导体的界面特性。在溶液处理的C6PcH 2薄膜的表面上观察到分子台阶和平台结构,这是由位于基底上的C6PcH 2柱组成的微晶的特征。表面电势根据距界面的距离而变化,并超过0.4 eV,这表明C6PcH 2之间的费米能级不同和n-Si。通过考虑真空能级移动和杂质载流子,讨论了表面电势与到界面的距离之间的线性和非线性关系。

更新日期:2019-12-19
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