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Reducing Interface Traps with High Density Hydrogen Treatment to Increase Passivated Emitter Rear Contact Cell Efficiency.
Nanoscale Research Letters ( IF 5.418 ) Pub Date : 2019-12-12 , DOI: 10.1186/s11671-019-3216-3
Chih-Cheng Yang , Po-Hsun Chen , Ting-Chang Chang , Wan-Ching Su , Sung-Yu Chen , Shui-Chin Liu , Sheng-Yao Chou , Yung-Fang Tan , Chun-Chu Lin , Pei-Yu Wu , Tsung-Ming Tsai , Hui-Chun Huang

In this work, a high-density hydrogen (HDH) treatment is proposed to reduce interface traps and enhance the efficiency of the passivated emitter rear contact (PERC) device. The hydrogen gas is compressed at pressure (~ 70 atm) and relatively low temperature (~ 200 °C) to reduce interface traps without changing any other part of the device's original fabrication process. Fourier-transform infrared spectroscopy (FTIR) confirmed the enhancement of Si-H bonding and secondary-ion mass spectrometry (SIMS) confirmed the SiN/Si interface traps after the HDH treatment. In addition, electrical measurements of conductance-voltage are measured and extracted to verify the interface trap density (Dit). Moreover, short circuit current density (Jsc), series resistance (Rs), and fill factor (F.F.) are analyzed with a simulated light source of 1 kW M-2 global AM1.5 spectrum to confirm the increase in cell efficiency. External quantum efficiency (EQE) is also measured to confirm the enhancement in conversion efficiency between different wavelengths. Finally, a model is proposed to explain the experimental result before and after the treatment.

中文翻译:

通过高密度氢处理减少界面陷阱,以提高钝化发射极后接触电池的效率。

在这项工作中,提出了一种高密度氢(HDH)处理方法,以减少界面陷阱并提高钝化发射极后接触(PERC)器件的效率。氢气在压力(〜70 atm)和相对较低的温度(〜200°C)下被压缩,以减少界面陷阱,而无需更改设备原始制造工艺的任何其他部分。傅里叶变换红外光谱(FTIR)证实了Si-H键的增强,二次离子质谱(SIMS)证实了HDH处理后的SiN / Si界面陷阱。另外,电导电压的电测量值被测量并提取以验证界面陷阱密度(Dit)。此外,短路电流密度(Jsc),串联电阻(Rs)和填充系数(FF)用1 kW M-2全球AM1.5光谱的模拟光源进行分析,以确认电池效率的提高。还测量了外部量子效率(EQE),以确认不同波长之间转换效率的提高。最后,提出了一个模型来解释治疗前后的实验结果。
更新日期:2019-12-12
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