Maskless atmospheric pressure PECVD of SiOx films on both planar and nonplanar surfaces using a flexible atmospheric microplasma generation device,Plasma Processes and Polymers

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Maskless atmospheric pressure PECVD of SiOx films on both planar and nonplanar surfaces using a flexible atmospheric microplasma generation device
Plasma Processes and Polymers ( IF 2.9 ) Pub Date : 2019-10-23 , DOI: 10.1002/ppap.201900142
Tao Wang ₁ , Jingquan Liu _{2,

3} , Liping Shi _{1,

4} , Xingquan Zhang ₁ , Li Lv ₁ , Guotao Zhang ₁ , Jun Wang ₁

Affiliation

This paper presents the use of a simple‐arranged, low‐cost, and flexible atmospheric pressure microplasma generation device (μPGD) with controlled gas discharge to achieve maskless atmospheric plasma‐enhanced chemical vapor deposition (PECVD) of SiO_x films on both planar and nonplanar surfaces. The μPGD is mainly composed of a copper–polyimide–copper sandwich structure with predefined microfluidic channels. Uniform microplasmas of different shapes and dimensions were generated in the open air. SiO_x films were masklessly deposited with well‐defined edges and good feature transfer fidelity. The SEM, EDS, XPS, and FTIR spectra of the deposited film confirm the SiO_x structure. These results indicate that μPGD is able to achieve maskless PECVD of SiO_x films in the open air, especially micropatterning on nonplanar surfaces.

中文翻译：

使用柔性大气微等离子体生成装置在平面和非平面表面上对SiOx膜进行无掩模大气压PECVD

本文介绍了使用简单的布置的，低成本的，灵活的大气压微等离子体产生装置（μPGD）配有控制的气体排出，以实现无掩模大气等离子体增强化学气相沉积（PECVD）由SiO _X在两个平坦薄膜和非平面表面。μPGD主要由具有预定微流体通道的铜-聚酰亚胺-铜夹心结构组成。在露天产生具有不同形状和尺寸的均匀微浆。SiO _x薄膜无掩模沉积，边缘清晰，特征转移保真度高。沉积膜的SEM，EDS，XPS和FTIR光谱证实了SiO _x结构。这些结果表明，μPGD能够实现SiO _x的无掩模PECVD 露天拍摄胶片，特别是在非平面表面上进行微图案制作。

更新日期：2019-10-23

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