Energetics of reactions in a dielectric barrier discharge with argon carrier gas: VIII hydrofluoromethanes,Plasma Processes and Polymers

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Energetics of reactions in a dielectric barrier discharge with argon carrier gas: VIII hydrofluoromethanes
Plasma Processes and Polymers ( IF 2.9 ) Pub Date : 2019-08-25 , DOI: 10.1002/ppap.201900125
Sean Watson ₁ , Bernard Nisol ₁ , Michael R. Wertheimer ₁

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The method we have developed for understanding energetic exchanges between precursor molecules and argon (Ar) carrier gas in a dielectric barrier discharge (DBD) has much‐proven merit. The present article focuses on hydrofluoromethanes, CH_xF_y. The precursors (‰ concentrations) were mixed with Ar in a 20 kHz, 8 kV (peak‐to‐peak) DBD. For each compound, E_m, the energy absorbed per molecule, was plotted as a function of precursor flow rate. Besides the determination of E_m, we have used optical emission spectroscopy as a diagnostic of the plasma physicochemistry. The influence of chemical structure has been investigated by depositing thin plasma polymer coatings; we have measured their deposition rates and water contact angles, which have been correlated with E_m values and X‐ray photoelectron spectroscopy measurements.

中文翻译：

介电势垒放电与氩载气的反应能量：VIII氢氟甲烷

我们开发的用于理解介电势垒放电（DBD）中前驱物分子与氩气（Ar）载气之间的能量交换的方法已被证明具有很多优点。本文重点介绍氢氟甲烷CH _x F _y。将前体（浓度为‰）在20 kHz，8 kV（峰对峰）DBD中与Ar混合。对于每种化合物，E _m（每个分子吸收的能量）与前驱物流速的关系作图。除了E _m的确定，我们已经使用光发射光谱作为等离子体物理化学的诊断方法。通过沉积薄的等离子聚合物涂层已经研究了化学结构的影响。我们已经测量了它们的沉积速率和水接触角，它们与E _m值和X射线光电子能谱测量相关。

更新日期：2019-08-25

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