当前位置: X-MOL 学术Plasma Processes Polym. › 论文详情
Our official English website, www.x-mol.net, welcomes your feedback! (Note: you will need to create a separate account there.)
TiO 2 thin film patterns prepared by chemical vapor deposition and atomic layer deposition using an atmospheric pressure microplasma printer
Plasma Processes and Polymers ( IF 2.9 ) Pub Date : 2019-09-18 , DOI: 10.1002/ppap.201900127
Morteza Aghaee 1 , Joerie Verheyen 1, 2 , Alquin A. E. Stevens 2 , Wilhelmus M. M. Kessels 1 , Mariadriana Creatore 1
Affiliation  

A microplasma printer is employed to deposit thin film patterns of TiO 2 by titanium tetra-isopropoxide and N 2/O 2 plasma at atmospheric pressure. The setup is adopted to carry out deposition in two configurations, namely under chemical vapor deposition (CVD) and atomic layer deposition (ALD) modes. The properties of TiO 2, as well as the patterning resolution, are investigated. The amorphous TiO 2 deposited in the CVD mode contains a relatively high level of impurities (residual carbon content of 5–10 at.%) and is characterized by a low refractive index of 1.8. With the ALD mode on the other hand, TiO 2 is obtained with a low level of impurities (<1 at.% C and <2 at.% N), a refractive index of 1.98, and a growth per cycle of 0.15 nm. Furthermore, the spatial resolution for a 8-nm-thick film is determined by X-ray photoelectron spectroscopy line scan and found to be equal to 2,000 and 900 µm for the CVD and ALD modes, respectively. This study can be regarded as the first step toward area-selective CVD and ALD of TiO 2 by a microplasma printer, which can be further explored and extended to other material systems.

中文翻译:

使用常压微等离子体打印机通过化学气相沉积和原子层沉积制备的 TiO 2 薄膜图案

使用微等离子体打印机在大气压下通过四异丙醇钛和 N 2/O 2 等离子体沉积 TiO 2 的薄膜图案。采用该装置以两种配置进行沉积,即在化学气相沉积 (CVD) 和原子层沉积 (ALD) 模式下。研究了TiO 2 的性质以及图案化分辨率。以 CVD 模式沉积的无定形 TiO 2 含有相对高水平的杂质(残留碳含量为 5-10 at.%),其特征是折射率低至 1.8。另一方面,使用 ALD 模式,获得的 TiO 2 杂质含量低(<1 at.% C 和 <2 at.% N),折射率为 1.98,每个循环的生长量为 0.15 nm。此外,8 nm 厚薄膜的空间分辨率由 X 射线光电子能谱线扫描确定,发现对于 CVD 和 ALD 模式分别等于 2,000 和 900 µm。该研究可以看作是通过微等离子体打印机实现 TiO 2 区域选择性 CVD 和 ALD 的第一步,可以进一步探索并扩展到其他材料系统。
更新日期:2019-09-18
down
wechat
bug