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Optimization of electrolyte concentration for surface modification of tantalum using plasma electrolytic nitridation
International Journal of Refractory Metals & Hard Materials ( IF 2.794 ) Pub Date : 2019-11-08 , DOI: 10.1016/j.ijrmhm.2019.105146
S. Padervand, M. Amiri, M. Mousavi khoei

Plasma Electrolytic Nitriding (PEN) is a cathodic atmospheric plasma process which has shown a promising deposition of metal coatings that exhibits a significant adhesion to the substrate as well as high deposition rates. The structure of tantalum alloy, microhardness and corrosion resistance behavior after cathodic plasma electrolytic nitriding (PEN) in electrolyte containing urea and distilled water were investigated. An Optical microscope (OM), X-ray diffractometer and scanning electron microscopy (SEM) were used to characterize the phase composition of the modified layer and its surface morphology. The corrosion resistance properties of nitrided tantalum alloy are investigated. It was shown that various electrolytes provided metallic tantalum (Ta), TaN0.43, TaN0.1, Ta4N, Ta4N5 and TaN phases and nitrogen solid solution in tantalum. The cathodic PEN with 78 wt% urea and 21.6 wt% distilled water had a microhardness of 1198.18 VHN, which was selected as the best sample in term of electrolyte composition.
更新日期:2019-12-11

 

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