The examined samples were W-Re and Mo-Re thin alloy layers with high content of Rhenium, applied in industry as protective coatings. The 550 nm of W-50.4%Re and 580 nm of Mo-39.5%Re alloys were deposited on crystalline silicon and amorphous silica substrates by magnetron sputtering method. For thermal characterization of investigated layers the scanning thermal microscopy (SThM) and high frequency photothermal radiometry (HF-PTR) measurements were carried out. The thermal methods were supported by the microstructural studies performed by the atomic force microscopy (AFM) and X-ray diffraction (XRD). The SThM method allowed determining the thermal conductivity (κ) of the alloy layers. From the HF-PTR the effective thermal conductivity (κ_eff) was determined directly. Estimation of the thermal boundary resistance (R_th) between particular alloy layer and its substrate enabled determination of the real κ of the layer with its thermal diffusivity (α) and effusivity (ε) from the HF-PTR fitting. The results showed, that W-Re and Mo-Re layers deposited on Si are characterized by higher κ, α, and ε values, and lower R_th in comparison to those deposited on SiO₂. The κ values for W-Re and Mo-Re layers deposited on Si and SiO₂ substrates were estimated in the range from 7 W·m⁻¹ K⁻¹ to 12 W·m⁻¹ K⁻¹, and 1.6 W·m⁻¹ K⁻¹ to 4 W·m⁻¹ K⁻¹, respectively. The correlation between the alloy layer structure, it's thermophysical properties and substrate structure was observed. The AFM and XRD measurements confirmed the short range order formation in Mo-Re layers deposited on Si.

检验的样品是具有高含量content的W-Re和Mo-Re薄合金层，在工业上用作保护性涂层。通过磁控溅射法将550 nm的W-50.4％Re合金和580 nm的Mo-39.5％Re合金沉积在晶体硅和非晶硅衬底上。为了对研究层进行热表征，进行了扫描热显微镜（SThM）和高频光热辐射（HF-PTR）测量。通过原子力显微镜（AFM）和X射线衍射（XRD）进行的微观结构研究为热学方法提供了支持。SThM方法可以确定合金层的热导率（κ）。从HF-PTR的有效热导率（κ _EFF）直接确定。估计特定合金层与其基底之间的热边界电阻（R _th）可以通过HF-PTR配件确定其真实κ及其热扩散率（α）和扩散率（ε）。结果表明，与沉积在SiO ₂上的那些相比，沉积在Si上的W-Re和Mo-Re层的特征在于更高的κ，α和ε值，以及更低的R _th。估计沉积在Si和SiO ₂衬底上的W-Re和Mo-Re层的κ值在7 W·m的范围内^-1  K ^-1至12 W·m ^-1  K ^-1和1.6 W·m ^-1  K ^-1至4 W·m ^-1  K ^-1。观察了合金层结构，热物理性质与基体结构之间的相关性。AFM和XRD测量证实了在Si上沉积的Mo-Re层中形成了短程有序。