In order to enhance the adhesion of cemented carbide diamond film and improve the cutting performance of cemented carbide diamond coating tools. This paper was the first to combine gaseous boronizing pretreatment with self-assembly seeding process to prepare diamond films on cemented carbide substrate. It not only eliminated the negative influence of cobalt (Co), but also improved the nucleation density of diamond. The gaseous boronizing pretreatment completed the boronation of the cemented carbide in a short time and obtained the CoWB phase which effectively prevented the diffusion of Co. By application of a self-assembly seeding process with the help of [2-(Methacryloyloxy) ethyl] trimethylammonium chloride (TMAEMC) highly improved the colloidal stability of nanodiamond (ND) particles. When the concentration of TMAEMC was 5 × 10⁻⁶ mol/l, the nucleation density of diamond was the highest. Rockwell indentation shows that the combination of gaseous boronizing pretreatment and TMAEMC self-assembly seeding process significantly improved the film-substrate adhesion. The reciprocating friction test shows that the diamond films prepared by this method had low friction coefficient and excellent wear resistance. Therefore, gaseous boronizing pretreatment combines with self-assembly seeding process is an effective way to achieve strong adhesion and high cutting performance of industrial diamond coating tools.

为了增强硬质合金金刚石膜的附着力，提高硬质合金金刚石涂层工具的切削性能。该论文是第一篇结合气态硼化预处理与自组装晶种工艺在硬质合金基体上制备金刚石膜的论文。它不仅消除了钴（Co）的负面影响，而且提高了金刚石的成核密度。气态硼化预处理在短时间内完成了硬质合金的硼化，并获得了有效防止Co扩散的CoWB相。通过在[2-（甲基丙烯酰氧基）乙基]三甲基铵的帮助下进行自组装晶种工艺氯化物（TMAEMC）大大提高了纳米金刚石（ND）颗粒的胶体稳定性。当TMAEMC的浓度为5×10时^-6  mol / l，金刚石的成核密度最高。洛氏压痕表明，气态硼化预处理与TMAEMC自组装接种工艺的结合可显着改善膜-基底的粘附性。往复摩擦试验表明，用该方法制得的金刚石膜摩擦系数低，耐磨性优良。因此，气态硼化预处理与自组装籽晶工艺相结合是实现工业金刚石涂层工具牢固附着力和高切削性能的有效途径。